Etching solution for display screen glass substrate based on nanometer silicon dioxide

A nano-silicon dioxide and glass substrate technology, applied in the field of etching solution for display glass substrates, can solve the problems of inconvenient metallographic slicing process, short use time, irritating odor, etc., and achieve controllable etching speed. , The effect of reducing surface tension and increasing etching speed

Inactive Publication Date: 2018-04-20
无锡南理工新能源电动车科技发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage is that the ammonia water in the microetching solution is volatile and has a pungent smell, so it is not conducive to operation, and the use time after configuration is short, only about 0.5 hours, which brings inconvenience to the metallographic section process

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] The preparation method of above-mentioned etchant for display glass substrate comprises the following steps:

[0046] The first step: add the weakly acidic cation exchange resin to 2.5% sodium silicate by weight, stir and mix, the stirring speed is 50 rpm, the stirring time is 5 minutes, the stirring temperature is 10°C, and then filter out the weak Acidic cation exchange resin to control or remove impurity ions in sodium silicate;

[0047] The second step: put 1.5% by weight of nano-silica and one-third of distilled water into the reaction kettle, fully stir at normal temperature and pressure, the stirring time is 10 minutes, and the stirring speed is 60 rpm , the stirring temperature is 14°C;

[0048] The third step: then add magnesium sulfate with a weight percentage of 1.2%, and fully stir for 6 minutes; add 0.5% by weight of sodium fluoroborate, and fully stir for 5 minutes; add one-third of distilled water, and fully stir for 4 minutes; add 2.5% by weight of sod...

Embodiment 2

[0055] The preparation method of above-mentioned etchant for display glass substrate comprises the following steps:

[0056] The first step: add the weakly acidic cation exchange resin to 2.8% sodium silicate by weight, stir and mix, the stirring speed is 55 rpm, the stirring time is 6 minutes, the stirring temperature is 12°C, and then filter out the weak Acidic cation exchange resin to control or remove impurity ions in sodium silicate;

[0057] Step 2: Put 2% by weight of nano-silica and one-third of distilled water into the reaction kettle, fully stir at normal temperature and pressure, the stirring time is 11 minutes, and the stirring speed is 65 rpm , the stirring temperature is 16°C;

[0058] The third step: then add magnesium sulfate with a weight percentage of 1.4%, and fully stir for 7 minutes; add 1.1% by weight of sodium fluoroborate, and fully stir for 6 minutes; add one-third of distilled water, and fully stir for 5 minutes; add 2.8% by weight of sodium silicat...

Embodiment 3

[0065] The preparation method of above-mentioned etchant for display glass substrate comprises the following steps:

[0066] The first step: add the weakly acidic cation exchange resin to 2.8% sodium silicate by weight, stir and mix, the stirring speed is 60 rpm, the stirring time is 7 minutes, the stirring temperature is 13°C, and then filter out the weak Acidic cation exchange resin to control or remove impurity ions in sodium silicate;

[0067] The second step: put 2.5% by weight of nano silicon dioxide and one-third of distilled water into the reaction kettle, fully stir at normal temperature and pressure, the stirring time is 12 minutes, and the stirring speed is 70 rpm , the stirring temperature is 18°C;

[0068] Step 3: Then add 1.6% magnesium sulfate by weight and stir for 7 minutes; add 1.6% sodium fluoroborate and stir for 7 minutes; add 1 / 3 of distilled water and stir for 6 minutes; add 3.3% by weight of sodium silicate, fully stirred for 7 minutes; added 2.3% by we...

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PUM

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Abstract

The invention discloses an etching solution for a display screen glass substrate based on nanometer silicon dioxide. The etching solution comprises the following compositions in percentage by weight:1.5-2.5 percent of nanometer silicon dioxide, 1.2-1.6 percent of magnesium sulfate, 0.5-1.6 percent of sodium fluoborate, 2.5-3.3 percent of sodium silicate, 1.5-2.3 percent of a non-protonic solvent,0.5-1.5 percent of a stabilizing agent, 3.5-6.5 percent of a de-foaming agent and the balance of distilled water. The etching solution disclosed by the invention has the benefit that through adding the nanometer silicon dioxide based on an original process, etching can be performed without corrosion-resistant coating penetration, so that the etching rate of a chromium metal film is remarkably improved, the etching rate is controllable, the deterioration of a corrosion-resistant protection layer is effectively inhibited, and a chrome metal film wire with an even and smooth surface is obtained.Therefore, the application value is important.

Description

technical field [0001] The invention relates to an etchant for display glass substrates based on nano silicon dioxide. Background technique [0002] At present, in the process of manufacturing display glass substrates, the quality of display glass substrates, the discovery and resolution of quality problems, and the evaluation of process improvement all need to be objectively inspected and judged by metallographic sections. The quality of the metallographic section directly affects the quality evaluation of the circuit board. The traditional metallographic slicing process includes sampling by milling; sealing the sample by resin mosaic method; grinding the sample; polishing the sample; microetching the sample. Wherein, the formula of the micro-etching liquid is 2-3 drops of hydrogen peroxide with a mass percentage of 50%, 8 ml of ammonia water with 25%-28%, and 8 ml of deionized water (DI water for short). Its disadvantage is that the ammonia water in the microetching solu...

Claims

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Application Information

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IPC IPC(8): C03C15/00C23F1/14
CPCC03C15/00C23F1/14
Inventor章锋赵丽马勇
Owner无锡南理工新能源电动车科技发展有限公司