Parallel circumferential direction continuous type plasma coating device
A technology of plasma and coating device, applied in the field of plasma coating device, can solve the problems of increasing production cost, production time and production space, complex structure of continuous vacuum coating equipment, increasing difficulty and cost of fault maintenance, and achieving vacuum maintenance. The method is simple, the equipment cost and maintenance cost are reduced, and the exchangeability is strong.
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[0034] In order to make the purpose, technical solutions and advantages of the present invention clearer, the present invention is further described in detail below in conjunction with the embodiments and the accompanying drawings:
[0035] For the convenience of description, in the present invention, the vacuum acquisition and recovery of the atmosphere in the vacuum system of the vacuum device will be briefly described.
[0036] The vacuum device is welded and assembled with structural metal carbon steel, stainless steel, etc. In order to obtain the required vacuum degree, the vacuum device needs to be equipped with a pumping system. Generally, the pumping system is divided into two parts: rough pumping system, fine pumping system, The rough pumping system generally consists of a mechanical pump with a high pumping speed, a Roots pump, and a fore-stage valve controlled by a cylinder and a solenoid valve. The process of vacuum acquisition is: start the pump group of the rough...
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