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Electrode vapor plating device

An evaporation and electrode technology, which is applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problems of increasing the operation steps of experimenters and the difficulty of operation

Active Publication Date: 2018-09-07
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Based on this, it is necessary to provide an easy-to-operate electrode evaporation device for the traditional electrode evaporation device that increases the operating steps of the experimenter and the difficulty of operation.

Method used

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  • Electrode vapor plating device
  • Electrode vapor plating device
  • Electrode vapor plating device

Examples

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Embodiment Construction

[0059] In order to make the object, technical solution and advantages of the present invention clearer, the electrode evaporation device of the present invention will be further described in detail through the following examples and in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0060] It should be noted that when an element is referred to as being “fixed” to another element, it can be directly on the other element or there can also be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present. The terms "vertical," "horizontal," "left," "right," and similar expressions ar...

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PUM

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Abstract

The invention relates to the technical field of material preparation, in particular to an electrode vapor plating device which comprises a supporting table, first limiting pieces, a mask frame, firstelastic pieces and a second limiting piece; the first limiting pieces are fixed on one side of the supporting table; the mask frame is arranged on the first limiting pieces in a sliding manner; each first elastic piece is arranged between the corresponding first limiting piece and the mask frame; the second limiting piece is arranged on the supporting table; a sample conveying gripper is utilizedto mount a sample to the supporting table and applies an external force to the second limiting piece, and the second limiting piece pushes the mask frame toward a direction far away from the supporting table under the effect of the external force; and when the external force is removed, the first elastic pieces push the mask frame toward a direction of the supporting table to enable a mask to be contacted with the sample. Therefore, by adopting the electrode vapor plating device provided by the invention, a single operation rod is not needed to operate the mask frame, and contact of the sampleand the mask is realized while conveying of the sample is finished, so that operation by a detector is convenient, the operation step is simplified, and the operation difficulty is lowered.

Description

technical field [0001] The invention relates to the technical field of material preparation, in particular to an electrode evaporation device. Background technique [0002] A traditional electrode evaporation device includes a sample holder socket, a first limit frame, a second limit frame, a magnetic rod, and a support structure. The sample holder socket, the first limiting frame and the second limiting frame are arranged on the surface of the supporting structure. The sample holder socket is used to fix the sample, and has two protruding rods opposite to each other, defining the X direction and the Y direction perpendicular to each other, and the connecting line of the two protruding rods is parallel to the X direction. The first limiting frame has two opposite first openings, the second limiting frame has two opposite second openings, the second limiting frame and the first limiting frame are sequentially sleeved on the on the sample holder socket, and the protruding ro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24
Inventor 郑澄胡小鹏薛其坤陈曦
Owner TSINGHUA UNIV