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A wafer chip testing method

A testing method and chip testing technology, applied in electronic circuit testing, single semiconductor device testing, electrical measurement, etc., can solve problems such as inability to effectively detect chip optical parameters

Active Publication Date: 2021-07-20
MAANSHAN JASON SEMICON CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a method for testing wafer chips, which solves the problem that the existing wafer chips of flip chip, vertical chip and ultraviolet chip type cannot effectively detect the real optical parameters of the chip

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  • A wafer chip testing method
  • A wafer chip testing method

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Embodiment Construction

[0044] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention , but not all examples. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0045] figure 1 Test schematics for existing wafer chips. Such as figure 1 As shown, the middle part of the stage 004 where the wafer is placed is hollowed out, or it is set as a light-transmitting stage.

[0046] The LED wafer 002 to be tested is vacuum-adsorbed or mechanically locked on the stage.

[0047] The probe 001 and the optical detection device 003 of the test devi...

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Abstract

The invention provides a wafer chip testing method. The method includes the following steps: performing a full-scale test on the first wafer chip to obtain first test data; wherein, the first wafer chip is located on a wafer that has not been thinned and cut, and the wafer can be cut into a plurality of first wafers round chip; carry out full-scale test on the second wafer chip, obtain the second test data; wherein, the second wafer chip is obtained after thinning and cutting the first wafer chip; for the corresponding first wafer chip The first test data of the wafer chip and the second test data of the second wafer chip are combined to obtain the third test data. In the wafer chip testing method provided by the present invention, the electrical data in the third test data is derived from the second electrical data in the second test data, which can truly characterize the yield condition after wafer dicing; the optical data in the third test data The first optical data derived from the first test data solves the problem that the wafer chip cannot detect the real optical parameters of the chip.

Description

technical field [0001] The invention relates to the technical field of chip testing and sorting, in particular to a wafer chip testing method. Background technique [0002] In the semi-finished state of the chip, that is, the state of the wafer without thinning and cutting (wafer without thinning and cutting: ChipOn Wafer), the semi-finished chip on each chip will be tested, and the photoelectric parameters will be used to determine whether the chip has The value of further processing. The test of semi-finished products can be a random test or a full test. For example, usually a random test refers to taking a certain number of chips from a single chip according to a certain ratio for testing, and counting whether the photoelectric parameters on it meet the preset standards and whether the yield level is up to standard. . The sampling yield can represent the overall yield level of the wafer to a certain extent. Unthinned and diced wafers that meet this yield requirement ar...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01R31/26G01R31/28
CPCG01R31/2601G01R31/2851
Inventor 姚禹郑远志陈向东梁旭东
Owner MAANSHAN JASON SEMICON CO LTD