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Discharge lamp and method for exchanging same, and exposure method and device

A replacement method and technology for discharge lamps, which are applied in the direction of photolithography exposure devices, parts of gas discharge lamps, microlithography exposure equipment, etc., and can solve the problems of exposure performance (deterioration of resolution, etc.)

Active Publication Date: 2018-11-09
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, if the discharge lamp used in the exposure device is used for more than a preset allowable time, the exposure performance (resolution, etc.) may deteriorate due to a decrease in illuminance.

Method used

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  • Discharge lamp and method for exchanging same, and exposure method and device
  • Discharge lamp and method for exchanging same, and exposure method and device
  • Discharge lamp and method for exchanging same, and exposure method and device

Examples

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no. 1 Embodiment approach

[0040] Below, refer to Figure 1 to Figure 13 A first embodiment of the present invention will be described.

[0041] figure 1 The schematic structure of the exposure apparatus EX provided with the light source apparatus 30 of this embodiment is shown. The exposure apparatus EX is, for example, a scanning exposure type projection exposure apparatus. exist figure 1 Among them, the light source device 30 has: a discharge lamp 1 composed of an arc discharge type ultra-high pressure mercury lamp; a support member 33 for holding the lamp head 26 on the cathode side of the discharge lamp 1; and a pull-out part 36 ( refer to Figure 4 (B)); the drive unit 34 for fixing and releasing the lamp head 26 relative to the supporting member 33; the elliptical mirror 2 (condensing mirror) disposed so as to surround the glass tube 25 (bulb) of the discharge lamp 1; and exposure When the discharge lamp 1 is used (when the discharge lamp 1 is in use), the box-shaped globe 31 accommodates th...

no. 2 Embodiment approach

[0119] refer to Figure 14 (A)~ Figure 15 (B) of 2nd Embodiment is demonstrated. The configuration of the cap on the anode side of the discharge lamp of this embodiment is different from that of the first embodiment. In addition, in Figure 14 (A)~ Figure 15 (B) pair with Figure 4 Parts corresponding to (A) and (B) in (A) and (B) are denoted by the same reference numerals, and detailed description thereof will be omitted.

[0120] Figure 14 (A) and (B) respectively show the cap 28A on the anode side of the discharge lamp 1A of this embodiment, and the power supply socket 152 which detachably connects the cap 28A and the cable 24A. exist Figure 14 In (A) and (B), the base 28A on the anode side includes a gripped portion 28Ae with a spherical outer surface, which is connected to the end portion of the rod-shaped portion 25c of the glass tube 25 of the discharge lamp 1A. 25d connection; a heat dissipation portion 28Ai having a plurality of endless belt-shaped heat di...

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Abstract

A discharge lamp is provided with a glass tube having an electrode for forming a light-emitting part provided therein, and a base provided at the end part of the glass tube. A light source device is provided with an emission unit for beaming a light beam into the through hole of the base of the discharge lamp, a light-receiving unit for detecting the light beam having passed through the through hole, and a light source control system for obtaining the angle of the discharge lamp using the result of the detection by the light-receiving unit. States of the discharge lamp, such as the rotation angle or whether or not the discharge lamp has already been used, can be easily verified.

Description

technical field [0001] The present invention relates to a discharge lamp and its replacement method, a light source device provided with a discharge lamp, an exposure method using the replacement method, an exposure device provided with the light source device, and a device manufacturing method using exposure technology. Background technique [0002] In the photolithography process used to manufacture various devices (liquid crystal display devices, semiconductor devices, etc.), in order to transfer the pattern formed on the photomask to the substrate (glass plate, semiconductor wafer, etc.) coated with photosensitive material Among the exposure apparatuses used, such as a projection exposure apparatus of a single-exposure type and a projection exposure apparatus of a scanning exposure type, there is a type that includes a light source device for exposure composed of a discharge lamp such as an ultra-high pressure mercury lamp combined with a condenser lens. [0003] In a co...

Claims

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Application Information

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IPC IPC(8): G03F7/20H01J61/50
CPCG03F7/20H01J61/50G03F7/2004G03F7/70258
Inventor 青木保夫
Owner NIKON CORP