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Substrate support structure

A support structure and support component technology, which is applied in the manufacture of electrical components, circuits, semiconductors/solid-state devices, etc., can solve the problems of substrate shedding, contact, transportation accuracy, installation accuracy, support position error, etc., to prevent falling off or touching the inaccessible range effect

Active Publication Date: 2018-11-13
KOYO THERMO SYST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007]However, when the substrate is supported from directly below, due to errors such as conveying accuracy, installation accuracy of the device, and accuracy of the supporting position, the substrate may fall off from the supporting part or cannot be touched. Possibility of exposure to range A1

Method used

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Embodiment Construction

[0040] Hereinafter, the configuration of the substrate supporting structure according to the embodiment of the present invention will be described with reference to the drawings.

[0041] like figure 1 As shown, a substrate to be processed (hereinafter referred to as “substrate”) W is accommodated and processed in a processing space 100 formed inside the processing container 4 . The substrate support structure 1 supports the substrate W in a substantially horizontal posture at a predetermined support position in the processing space 100 . The substrate supporting structure of the present invention is applicable to a batch furnace or the like of a substrate processing apparatus (for example, a heat processing apparatus, etc.) that performs certain processing on a substrate. Regardless of the material of the substrate, it is also possible to support thin and warped substrates. The shape of the substrate is not limited to a rectangular substrate, and may be a circular substrat...

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PUM

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Abstract

The invention provides a substrate support structure that prevents a substrate from falling off from a support part and also from coming into contact with an untouchable range even if there is an error in transportation accuracy, installation accuracy of a device and accuracy of a support position or the like. The substrate support structure (1) includes a substrate support member (2), and a holding member (3). The substrate support member 2 extends from the base end side toward the tip side and a processed substrate (W) is supported by a support part (2C) formed on the upper side. On both sides of a support position of the substrate (W), the holding member (3) supports the substrate support member (2) so that the support part (2C) is inclined downward from the base end (2A) side toward the tip (2B) side.

Description

[0001] This application is a divisional application of an invention patent application with an application date of September 17, 2014, an invention title of "substrate support structure", and a national application number of "201410474841.6". technical field [0002] The present invention relates to a substrate support structure provided in a substrate heat treatment apparatus or the like for supporting a substrate in a substantially horizontal posture. Background technique [0003] Conventionally, when heat-treating a substrate for liquid crystal or organic EL, the substrate is held in a heat-treating apparatus so as to support the lower surface of the substrate. In this case, the central portion of the substrate may be supported instead of the peripheral portion (approximately 10 mm from the outer edge) that will not be affected even if it touches the support portion, and there is a limitation that the allowable range of contact is narrow. [0004] To overcome this limitat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/687
CPCH01L21/68785H01L21/6875
Inventor 中谷淳司
Owner KOYO THERMO SYST CO LTD