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Injector and process device containing injector thereof

A technology of injectors and process chambers, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., to achieve the effect of reducing defects and reducing defect sources

Inactive Publication Date: 2018-11-23
HUAIAN IMAGING DEVICE MFGR CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, using the existing injector to deliver the process gas to the process device brings more defects to the process in the process device

Method used

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  • Injector and process device containing injector thereof
  • Injector and process device containing injector thereof
  • Injector and process device containing injector thereof

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0024] As mentioned in the background, the use of existing injectors brings many defects to subsequent processes.

[0025] figure 1 Is a schematic diagram of the structure of the injector.

[0026] Please refer to figure 1 , the injection cavity 100; the first opening 110 at the top of the injection cavity 100, the first opening 110 is used to input the first gas 1 into the injection cavity 100; the second at the bottom of the injection cavity 100 The opening 120 , the second opening 120 is used to output the first gas 1 .

[0027] In the above-mentioned injector, the first gas 1 enters the injection cavity 100 through the first opening 110 , and the first gas 1 flows along the inner wall of the injection cavity 100 to the second opening 120 . The first gases 1 are likely to react with each other to form by-products 130 . When the first gas 1 flows from the first opening 110 to the second opening 120 , the by-product 130 is driven to flow to the second opening 120 .

[00...

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PUM

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Abstract

The present invention discloses an injector and a process device containing the injector thereof. The injector comprises an injecting cavity, wherein the top of the injecting cavity is provided with afirst opening, the first opening is used for inputting a first gas into the injecting cavity, and the injecting cavity comprises a reference surface perpendicular to the inside wall of the injectingcavity; a flow-guiding device located in the injecting cavity, wherein a gas channel is arranged between the flow-guiding device and the injecting cavity, the gas channel is used for allowing the first gas to pass through, the flow-guiding device comprises a first area and a second area located at the bottom of the first area, the first area of the flow-guiding device has a first projection on thereference surface, the second area of the flow-guiding device has a second projection on the reference surface, and the first projection is located in the second projection; and a second opening located at the bottom of the injecting cavity, wherein the second opening is used for outputting the first gas. The injector can reduce the defects brought to the subsequent processes.

Description

technical field [0001] The invention relates to the field of semiconductors, in particular to an injector and a process device including the injector. Background technique [0002] In the field of semiconductors, a large amount of process gas needs to be used, and the process gas is usually transported into a process device through an injector for corresponding process treatment. [0003] However, using the existing injector to deliver the process gas to the process device brings more defects to the process in the process device. Contents of the invention [0004] The technical problem solved by the present invention is to provide an injector and a process device including the injector, so as to reduce defects brought to subsequent processes. [0005] In order to solve the above technical problems, the present invention provides an injector, comprising: an injection cavity, the top of the injection cavity has a first opening, the first opening is used to input the first g...

Claims

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Application Information

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IPC IPC(8): H01L21/67
CPCH01L21/67017H01L21/6719
Inventor 曾德强陈伏宏刘家桦叶日铨
Owner HUAIAN IMAGING DEVICE MFGR CORP