A kind of transparent flexible and stretchable electromagnetic shielding film and preparation method thereof
An electromagnetic shielding film, a transparent technology, applied in the fields of magnetic/electric field shielding, chemical instruments and methods, electrical components, etc., which can solve the problems of low cost, lack of stretchability and high production costs that are not suitable for large-scale production. , to achieve the effect of high light transmittance and electromagnetic shielding efficiency, easy performance control and good stability
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Embodiment 1
[0074] The precursor of polydimethylsiloxane (PDMS) and its curing agent were mixed at a mass ratio of 10:1, and the mixed solution was spin-coated on a glass substrate by a spin-coating process, and then heated and cured at 60°C for 30 min to form a semi- Cured PDMS film. The thickness of the final PDMS film (20-500 μm) can be adjusted by controlling the spin-coating speed (400-2000 rpm) and time (5-30 s). Using the ethanol / water dispersion of polystyrene (PS) microspheres with an average particle size of 10 μm as the colloid, the PS microsphere colloid monolayer self-assembled on the surface of the PDMS film by the gas-liquid interface self-assembly method to form a closely arranged PS colloid array . Then use plasma (Plasma) to etch the closely arranged PS colloidal particles into a non-closely arranged structure in an oxygen atmosphere. The degree of etching (the distance between adjacent PS colloidal particles) can be determined by etching power and etching time. In thi...
Embodiment 2
[0076] Using thermoplastic polyurethane (TPU) as raw material, dissolve it with N,N-dimethylformamide (DMF) to prepare a certain concentration of TPU / DMF solution, pour it into a flat PTFE container, heat and dry it, and then shape it into TPU Transparent film. Silicon dioxide (SiO2) with an average particle size of 500nm 2 ) microsphere dispersion is a colloid, and the SiO 2 Microsphere colloidal monolayer self-assembled on the surface of TPU film to form tightly arranged SiO 2 colloidal array. In repassing reactive ion etching (RIE), the closely arranged PS colloidal particles are etched into a non-closely arranged structure, and the degree of etching (adjacent SiO 2 The distance between colloidal particles) can be regulated by etching processes such as gas flow, temperature, and gas pressure. In this case, SiO 2 The shortest distance between colloidal particles is controlled at about 200nm. Deposition of gold onto the aforementioned non-closely packed SiO by magnetron ...
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