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A self-aligned hybrid bonding structure and a manufacturing method thereof

A manufacturing method and self-alignment technology, applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as unsatisfactory three-dimensional stacking technology, lower overall bonding reliability, counter-rotation error, etc., to achieve Avoid the effects of bonding precision limitations

Active Publication Date: 2019-01-04
SHANGHAI INTEGRATED CIRCUIT RES & DEV CENT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this wafer bonding process with a smooth surface, high-precision metal-to-metal alignment is required during bonding. Since the current optical alignment technology for bonding alignment can only use infrared light sources, the alignment accuracy There is a theoretical limit, and there is usually a counter-rotation error. When the alignment error is large, the metal contact surface is too small, which will make the resistance too high
At the same time, the part where the metal-insulation layer contacts cannot obtain high-strength bonding force, which will reduce the reliability of the overall bonding
Therefore, the current optical alignment technology using infrared light sources can no longer meet the requirements of three-dimensional stacking technology. To further improve the bonding alignment accuracy, other process technologies are needed.

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  • A self-aligned hybrid bonding structure and a manufacturing method thereof
  • A self-aligned hybrid bonding structure and a manufacturing method thereof
  • A self-aligned hybrid bonding structure and a manufacturing method thereof

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Embodiment Construction

[0041] In order to make the purpose, technical solution and advantages of the present invention clearer, the specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0042] Please refer to the accompanying drawings, a method for fabricating a self-aligned hybrid bonding structure provided by the present invention includes the following steps:

[0043] S01: Please refer to the attached figure 1 , perform pretreatment on the identical metal interconnection structure I and metal interconnection structure II, wherein metal interconnection structure I and metal interconnection structure II include an interconnection medium layer 100 and the The metal interconnection layer, and the upper surface of the metal interconnection layer of the interconnection medium layer is flush with the upper surface of the interconnection medium layer.

[0044] In the present invention, the above-mentioned metal i...

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Abstract

The invention discloses a self-aligned hybrid bonding structure, comprising a self-aligned structure I with an inverted trapezoidal groove III and a self-aligned structure II with a regular trapezoidal second dielectric layer pattern, wherein the inverted trapezoidal groove III and the regular trapezoidal second dielectric layer pattern can be closely bonded; The self-aligned structure I comprisesa metal interconnect structure I, a first dielectric layer located above the metal interconnect structure I, the inverted trapezoidal groove III penetrating the first dielectric layer, and the inverted trapezoidal groove II does not overlap with the metal interconnect layer in the vertical direction; The self-aligned structure II comprises a metal interconnect structure II, a first dielectric layer on the metal interconnect structure II, and a regular trapezoidal second dielectric layer pattern, the regular trapezoidal second dielectric layer pattern being located above the second dielectriclayer. The self-aligned structure II comprises a metal interconnect structure II, a first dielectric layer on the metal interconnect structure II, and a regular trapezoidal second dielectric layer pattern. The invention provides a self-aligned hybrid bonding structure and a manufacturing method thereof, which can improve the alignment accuracy and the bonding quality when the hybrid bonding is performed.

Description

technical field [0001] The invention relates to a hybrid bonding technology, in particular to a self-aligned hybrid bonding structure and a manufacturing method thereof. Background technique [0002] With the development of semiconductor VLSI, the existing technology has approached the physical limit. Driven by the further miniaturization and multi-functionalization of electronic products, other new technologies, new materials, and new technologies have been explored. Three-dimensional stack packaging technology is one of them. The three-dimensional stacked packaging technology stacks silicon wafers through bonding technology to realize a three-dimensional metal interconnection structure, which can reduce the interconnection distance, increase the transmission speed, reduce the device volume, and provide the possibility of heterogeneous structure integration. [0003] Wafer bonding technology is one of the important means to realize three-dimensional stacking. Wafer bondi...

Claims

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Application Information

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IPC IPC(8): H01L21/02H01L23/544
CPCH01L21/02016H01L21/02019H01L23/544H01L2223/54426
Inventor 葛星晨
Owner SHANGHAI INTEGRATED CIRCUIT RES & DEV CENT