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A kind of wafer detection method

A detection method, wafer technology, applied in semiconductor/solid-state device testing/measurement, electrical components, circuits, etc., and can solve problems such as deficiencies

Active Publication Date: 2021-09-17
SUZHOU JINGLAI OPTO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] At present, the technology of ultra-micro display and near-eye large-screen equipment with wafer as the core is relatively new, and the wafer manufacturing process is still in the stage of exploration and trial. Therefore, there may be some defects in the wafer manufacturing process. The adjustment of the manufacturing process in the wafer requires defect inspection on the wafer. However, the existing market is still lacking in wafer inspection methods

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  • A kind of wafer detection method
  • A kind of wafer detection method
  • A kind of wafer detection method

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Embodiment Construction

[0039] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and through specific implementation methods.

[0040] This embodiment discloses a wafer detection device, such as figure 1 and 2 As shown, the wafer detection equipment includes a working platform 1, on which at least a macroscopic detection station 2 and a microscopic detection station 3 are arranged, and a handling device 5 is also arranged on the working platform 1, and the handling device 5 can The wafer to be inspected is transported to the macro inspection station 2 and the micro inspection station 3. By setting the macro inspection station 2 and the micro inspection station 3 on the wafer inspection equipment, the wafer can be inspected macroscopically and microscopically. Among them, the macro inspection station 2 mainly observes the defects visible to the naked eye on the wafer; the microscopic inspection Station 3 mainly uses the mic...

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Abstract

The invention belongs to the technical field of electronic product processing and production, and discloses a wafer detection method, which includes S1, providing a wafer detection device, the wafer detection device is provided with at least a macro detection station and a micro detection station; S2, Transporting the wafer to be inspected to the macro inspection station and / or the micro inspection station, and performing macro inspection and / or micro inspection on the wafer to be inspected; S3, moving the inspected wafer out of the wafer Round detection equipment. The wafer inspection method of the present invention provides a wafer inspection device with a macro inspection station and a micro inspection station, so that the wafer can be inspected macroscopically and microscopically. Defects: The micro-inspection station mainly observes the defects on the wafer that are invisible to the naked eye through microscope equipment, so that it can comprehensively detect and analyze the defects of the wafer caused by the processing technology, so as to make timely improvements.

Description

technical field [0001] The invention relates to the technical field of electronic product processing and production, in particular to a wafer detection method. Background technique [0002] Wafer microdisplay devices are different from conventional AMOLED devices that use amorphous silicon, microcrystalline silicon or low-temperature polysilicon thin film transistors as backplanes. They use monocrystalline silicon chips as the base, and the pixel size is 1 / 10 of that of traditional display devices. [0003] Wafer microdisplays have a broad market application space, especially suitable for helmet-mounted displays, stereoscopic display mirrors, and eye displays, and can be used for portable computers, wireless Internet browsers, portable DVDs, game platforms, and wearable computers. Mobile information products provide high-quality video display, and even when combined with mobile communication networks and satellite positioning systems, accurate image information can be obtain...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/66H01L21/67
CPCH01L21/67259H01L22/26
Inventor 朱志飞舒文宾杨慎东郭连俊
Owner SUZHOU JINGLAI OPTO CO LTD