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A method and device for producing chlorosilanes using organic silicon slag

A chlorosilane and organosilicon technology, applied in the field of chlorosilane production, can solve the problems of high impurity content, small particle size of silicon slag, and difficult reaction control.

Active Publication Date: 2020-10-20
四川敏田科技发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are many problems in the utilization of silicon slag, the main difficulty is that the particle size of silicon slag is extremely small (400-800 mesh), the content of impurities is large, and the reaction is difficult to control, etc.

Method used

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  • A method and device for producing chlorosilanes using organic silicon slag
  • A method and device for producing chlorosilanes using organic silicon slag
  • A method and device for producing chlorosilanes using organic silicon slag

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Experimental program
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Effect test

Embodiment 1

[0082] This embodiment provides a method for producing chlorosilanes using organic silicon slag, which uses the gas-solid mixing device provided in the embodiment of the present invention to mix silicon slag and reaction gas, including the following steps:

[0083] First, the inert gas is used to pass through the mixing device at high speed to generate a negative pressure of about 2kpa at the inlet of the silicon slag and the reaction gas inlet, so that the silicon slag and the reaction gas are mixed evenly in the mixing device, wherein the flow rate of the inert gas The reaction gas is hydrogen chloride, and the material ratio of silicon slag to hydrogen chloride is 28:140.

[0084] Secondly, the mixed gas is reacted at a temperature of about 240°C, initially cooled at a temperature of about 130°C, and then secondary cooled at a temperature of 70°C to obtain chlorosilane gas. After the secondary cooling process, it will be deposited on The metal chlorides in the cooler are co...

Embodiment 2

[0087] This embodiment provides a method for producing chlorosilanes using organic silicon slag, which uses the gas-solid mixing device provided in the embodiment of the present invention to mix silicon slag and reaction gas, including the following steps:

[0088] First, the inert gas is used to pass through the mixing device at high speed to generate a negative pressure of about 20kpa at the inlet of the silicon slag and the reaction gas inlet, and then the silicon slag and the reaction gas are mixed evenly in the mixing device, wherein the flow rate of the inert gas is 300m / s, the reaction gas is hydrogen chloride, and the material ratio of silicon slag to hydrogen chloride is 56:140.

[0089] Secondly, the mixed gas is reacted at a temperature of about 350°C, initially cooled at a temperature of about 160°C, and then secondary cooled at a temperature of 130°C to obtain chlorosilane gas. After the secondary cooling process, it will be deposited on The metal chlorides in the...

Embodiment 3

[0092] This embodiment provides a method for producing chlorosilanes using organic silicon slag, which uses the gas-solid mixing device provided in the embodiment of the present invention to mix silicon slag and reaction gas, including the following steps:

[0093] First, the inert gas is used to pass through the mixing device at a high speed to generate a negative pressure of about 15kpa at the inlet of the silicon slag and the reaction gas inlet, so that the silicon slag and the reaction gas are mixed evenly in the mixing device, wherein the flow rate of the inert gas is 200m / s, the reaction gas is chlorine, and the material ratio of silicon slag to chlorine is 27:140.

[0094] Secondly, the mixed gas is reacted at a temperature of about 300°C, initially cooled at a temperature of about 150°C, and then secondary cooled at a temperature of 100°C to obtain chlorosilane gas. After the secondary cooling process, it will be deposited on The metal chlorides in the cooler are colle...

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Abstract

The invention discloses a method and an apparatus for producing chlorosilane by using organosilicon residue, and relates to the technical field of organosilicon. The method comprises that negative pressures are generated at a silicon residue inlet and a reaction gas inlet through the high-speed flowing of an inert gas in a mixing device, such that silicon residue and a reaction gas are uniformly mixed in the mixing device, wherein the flow rate of the inert gas is 100-300 m / s, and the reaction gas is hydrogen chloride or chlorine gas; and the mixed gas is subjected to a reaction at a temperature of 240-350 DEG C, primary cooling is performed at a temperature of 130-160 DEG C, and secondary cooling is performed at a temperature of 70-130 DEG C to obtain the chlorosilane gas. According to the present invention, the apparatus for producing chlorosilane by using organosilicon residue is the apparatus performing the method, wherein the complete mixing of the silicon residue and the reactiongas is achieved by improving the gas-solid mixing device, such that the chlorosilane product is obtained through reaction and impurity removing.

Description

technical field [0001] The invention relates to the technical field of organosilicon, and in particular to a method and a device for producing chlorosilane by using organosilicon slag. Background technique [0002] In recent years, with the continuous development of the domestic economy, the organic silicon industry has developed rapidly. With the rapid increase in the production capacity of organosilicon monomer methylchlorosilane, the amount of its by-products is also increasing; if not handled properly, it will not only endanger the environment, but also seriously affect the healthy development of the organosilicon industry. It is understood that the waste produced by every 100kg of methylchlorosilane produced abroad has dropped from 28kg in 1960 to 3.5kg, and the waste has been well treated; while the waste produced by the production of methylchlorosilane in my country has reached 10-11kg , the waste has not been properly disposed of. [0003] Silicon slag is the main s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107
CPCC01B33/10726C01B33/10736C01B33/10752C01B33/10763
Inventor 王姗沈祖祥
Owner 四川敏田科技发展有限公司