Semiconductor detector and semiconductor detector manufacturing method
A technology for semiconductors and detectors, applied in the field of detectors, can solve the problems of limited influence of the electric field distribution of the detectors, single design of the pixel array unit electrodes, affecting the carrier collection capability of the detectors, etc., so as to increase the collection of carrier charges. total area, improved collection efficiency, enhanced unipolar collection characteristics
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no. 1 example
[0036] Such as figure 1 As shown, the present embodiment provides a semiconductor detector, including: a semiconductor crystal 110, a cathode 120, and an anode 130; the semiconductor crystal 110 includes a first surface and a second surface oppositely arranged on both sides of the semiconductor crystal 110; the cathode 120 Set on the first face of the semiconductor crystal 110; the anode 130 is set on the second face of the semiconductor crystal 110, the anode 130 includes: a collecting electrode 131 and a weighted gate electrode 132, and the weighted gate electrode 132 is arranged around the collecting electrode 131; wherein, the collecting electrode 131 And / or the weight grid electrode 132 is an electrode with a three-dimensional composite structure.
[0037] Specifically, the semiconductor crystal 110 serves as a detection medium of the semiconductor detector. In this embodiment, the semiconductor crystal 110 is a CdZnTe crystal. The first surface and the second surface of...
no. 2 example
[0056] This embodiment provides a method for manufacturing a semiconductor detector, and the method is applied to prepare the semiconductor detector described in the first embodiment above.
[0057] Such as image 3 As shown, the method specifically includes the following steps:
[0058] S201. Perform femtosecond laser ablation on the semiconductor crystal on the optical path platform for femtosecond laser ablation processing, and form a three-dimensional composite structure extending in the depth direction of the first surface on the second surface of the semiconductor crystal;
[0059] S202. Prepare an anode and a cathode on a semiconductor crystal having a three-dimensional composite structure; wherein, the anode includes a collection electrode and a weighted grid electrode arranged around the collection electrode.
[0060] Specifically, before preparing the above-mentioned semiconductor detectors, it is first necessary to build such Figure 4 The optical path platform fo...
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