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A decompression drying equipment

A technology of drying equipment and air pressure adjustment, which is applied in the direction of photomechanical equipment, photoplate-making process coating equipment, instruments, etc., and can solve problems affecting product characteristics and uneven thickness of photoresist on the surface of glass substrates, etc.

Active Publication Date: 2020-06-30
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Abstract
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AI Technical Summary

Problems solved by technology

The photoresist itself is liquid and has a certain fluidity. When the air supply pressure of the decompression drying equipment is unstable, the photoresist may flow in a small range when the airflow passes through the surface of the substrate, so that the thickness of the photoresist on the surface of the glass substrate Inhomogeneity occurs, affecting product characteristics

Method used

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  • A decompression drying equipment
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Embodiment Construction

[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0025] In the process of active matrix organic light-emitting diodes or active-matrix organic light-emitting diodes (AMOLED), baking of organic photoresist by vacuum drying equipment is an important process. The purpose is to evenly volatilize the organic solvent in the photoresist, so that the polymer material of the photoresist can be polymerized better and more uniformly. The baking process of the decompression drying equipment mainly uses air circulation to take away the o...

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Abstract

Disclosed is a vacuum drying device. The device comprises a sealed chamber, an air pressure adjustment apparatus and a bearing platform located in the sealed chamber, wherein the air pressure adjustment apparatus comprises main air pipes (110) and branch air pipes (120), the branch air pipes (120) are connected to the main air pipes (110), and the main air pipes (110) are arranged in a vertically symmetrical manner on a side surface of the sealed chamber. By designing the main air pipes (110) to be vertically symmetrical, the air supply distance of the branch air pipes (120) is shortened, thus the airflow pressure drop is reduced, so that upper and lower air pressures are stable, and product characteristics are stable.

Description

technical field [0001] The invention relates to the technical field of semiconductor production equipment, in particular to a decompression drying equipment. Background technique [0002] In the substrate manufacturing process of TFT-LCD (Thin Film Transistor-Liquid Crystal Display, referred to as Thin Film Transistor-Liquid Crystal Display), vacuum decompression drying (Vacuum Dry, referred to as VCD) is an important process. Vacuum decompression drying is to perform decompression drying treatment on the substrate coated with the coating liquid of the film layer such as photoresist, so that the film layer is cured. [0003] The complete photolithography process completes the definition of precise patterns on the substrate through the three main steps of photoresist coating process, exposure process, and development process. In the decompression drying process after the coating process, the substrate coated with photoresist is placed in a sealed chamber, and the sealed cham...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/16G02F1/13
CPCG02F1/1303G03F7/168
Inventor 管源
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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