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Ion source support table

A technology of ion source and support table, which is applied in the direction of ion beam tube, discharge tube/lamp parts, discharge tube, etc., and can solve the problems of ion source support table man-made disasters, roller detachment, instability, etc.

Active Publication Date: 2020-11-03
NISSIN ION EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, as mentioned above, if you want to place the rollers on the rails while keeping the ion source suspended, for example, there may be the following problems: the ion source shakes and becomes unstable, causing the rollers and the rails to become unstable. position deviation
If the rollers are placed on the rails in a state where the positions have been shifted, the following problems may occur: the rollers will come off the rails, the ion source will fall from the ion source support table, the ion source and the ion source support table will be damaged, Man-made disasters occur around the ion source support table

Method used

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Examples

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Embodiment Construction

[0037] One embodiment of the ion source support stand of the present invention will be described.

[0038] The ion source support table X of this embodiment supports the ion source 101 which comprises the ion irradiation apparatus 100, and is used for conveying the ion source 101 to a predetermined position.

[0039] First, edge reference figure 1 The ion irradiation apparatus 100 will be described.

[0040] The ion irradiation device 100 is for example used in semiconductor manufacturing, and includes a device main body 102 and an ion source 101. The device main body 102 includes a mass separator 103 and a separation slit 104, etc., and the ion source 101 is detachable relative to the device main body 102. The ion irradiation apparatus 100 irradiates the wafer W supported on the support rack 105 with an ion beam extracted from the ion source 101 .

[0041] The ion source 101 generates an ion beam containing predetermined ions such as phosphorus, arsenic, and boron, and emit...

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PUM

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Abstract

To enable an ion source 101 mounted on an ion source support base X to assume a lain posture in a stable condition.SOLUTION: There is provided an ion source support base X on which an ion source 101 comprising a long-shaped plasma generation container 10 and a pair of rollers 31 provided in side walls 11b of the plasma generation container 10 are mounted, the side walls 11b being opposite to a direction orthogonal to a longitudinal direction in the long-shaped plasma generation container 10. The ion source support base X comprises: a pair of rails 5 on which the pair of rollers 31 is mounted rollably while the ion source 101 is suspended; and a dragging mechanism 6 that drags the ion source 101 from one end side A of a rail 5 to the other end side B while the pair of rollers 31 is mounted on the pair of rails 5.SELECTED DRAWING: Figure 3

Description

technical field [0001] The present invention relates to an ion source support table for supporting an ion source. Background technique [0002] As disclosed in Patent Document 1, as a conventional ion source support stand, there is an ion source support stand for placing and transporting an ion source removed from an apparatus main body such as an ion beam irradiation apparatus. The aforementioned Patent Document 1 describes that in order to transport an ion source having a large height in a stable state, the ion source in a standing posture is laid down, and the ion source is supported in a fallen posture with a reduced height. [0003] Specifically, the ion source includes a pair of rollers provided so as to sandwich the ion extraction port, and a pair of rails on which the pair of rollers are rotatably placed is provided on the ion source support table. [0004] In addition, when the ion source is removed from the main body of the apparatus, the ion source is tilted forw...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B65G35/00B65G47/24
CPCB65G35/00B65G47/24B65G2201/0214H01J3/38H01J27/022H01J37/08
Inventor 丹羽雄一西村一平小野田正敏立道润一
Owner NISSIN ION EQUIP CO LTD