Atomic force microscope externally-connected equipment multiple-parameter in-situ measuring system and method

An atomic force microscope and external equipment technology, used in measurement devices, scanning probe microscopy, instruments, etc., can solve problems such as the inability to achieve simultaneous isotopic characterization of information

Inactive Publication Date: 2019-05-24
NANCHANG UNIV
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Problems solved by technology

[0004] In the existing technology, the characterization of surface topography, surface local potential and surface electrical property images can be realized, but the simultaneous co-position characterization of these information cannot be realized, that is to say, the surface topography and surface local potential of the sample cannot be obtained by one scan. and surface electrical properties images

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  • Atomic force microscope externally-connected equipment multiple-parameter in-situ measuring system and method
  • Atomic force microscope externally-connected equipment multiple-parameter in-situ measuring system and method
  • Atomic force microscope externally-connected equipment multiple-parameter in-situ measuring system and method

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Embodiment Construction

[0032] Below will combine the appended in the embodiment of the present invention Figure 1-2 , clearly and completely describe the technical solutions in the embodiments of the present invention, obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0033] The invention discloses a multi-parameter in-situ measurement system for external equipment of an atomic force microscope, comprising a signal input and output instrument 1, a current / voltage source output instrument 2, an AFM controller 3, an electronic box, a MAC / ACC controller, and a photoelectric signal detector , a conductive microcantilever probe, a sample stage for placing samples, a laser signal, a sample, the current / voltage source output instrumen...

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Abstract

The invention relates to an atomic force microscope externally-connected equipment multiple-parameter in-situ measuring system which comprises a signal input-output instrument, a current/voltage source output instrument, an AFM controller, an electronic box, an MAC/ACC controller, a photoelectric signal detector, an electroconductive microcantilever probe, a sample table, a laser signal and a sample. The current/voltage source output instrument is connected on a BNC port of IN/OUT of a current signal of the signal input-output instrument and connected with a computer host, the signal input-output instrument connects the AFM controller with the MAC/ACC controller and connects an aromatic force microscope base electric signal end with the AFM controller, the electronic box connects the MAC/ACC controller with the atomic force microscope base electric signal end, the electroconductive microcantilever probe is connected with the electronic box, and the photoelectric signal detector is arranged on the outer side of the electroconductive microcantilever probe and connected with the electronic box. The system can detect surface potential and electrical properties of a certain micro area under an electrical signal in real time to acquire shape characteristics.

Description

technical field [0001] The invention relates to the measurement technology of surface topography, surface local potential and surface electrical properties, and specifically discloses a multi-parameter in-situ measurement system for external equipment of an atomic force microscope and a measurement method for the system. Background technique [0002] The Kelvin Force Microscopy (KFM) is based on the AC Mode or Trapping Mode of the Atomicforce Microscopy (AFM), which uses the conductive probe of the AFM to realize the characterization of the local potential of the sample surface. The Kelvin mode detection signal is the electrostatic force between the tip and the sample. As a high-resolution detection technology for detecting the work function of the sample surface at the microscopic scale, its detection mechanism includes force modulation and frequency modulation. By adjusting the voltage difference between the probe and the sample To compensate for the electrostatic force of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01Q60/30
Inventor 刘贝程抱昌陈涛文陈诗名罗超
Owner NANCHANG UNIV
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