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113 results about "Kelvin" patented technology

The kelvin is the base unit of temperature in the International System of Units (SI), having the unit symbol K. It is named after the Belfast-born, Glasgow University engineer and physicist William Thomson, 1st Baron Kelvin (1824–1907).

Packaging structure and packaging method for silicon carbide power device

The invention discloses a packaging structure and a packaging method for a silicon carbide power device. The packaging structure comprises a direct bond copper (DBC) ceramic substrate, a silicon carbide power device, a PCB, leads and a shell and forms a half-bridge circuit structure formed by the silicon carbide power device. According to the packaging structure and the packaging method provided by the invention, the area of a power circuit can be effectively reduced, conductors with opposite current flowing directions are formed during a commutation process by a switch transistor, mutual inductance offset is used for reducing parasitic inductance of a commutation circuit, and overvoltage and oscillation during the switching process can be effectively reduced; driving signal leads adopt a Kelvin connection mode and are vertical to power leads, a role of effectively reducing coupling between a driving circuit and a power circuit is played, and driving stability is enhanced; the DBC substrate and the PCB are welded thoroughly, and packaging reliability is enhanced; and power terminals and signal terminals are directly included in the PCB, thereby reducing contact resistance and parasitic inductance brought by extra terminals and achieving effects of reducing the cost.
Owner:HUAZHONG UNIV OF SCI & TECH

Testing method for water vapor penetration rate of thin film

The invention discloses a testing method for the water vapor penetration rate of a thin film. The testing method comprises the following steps: S1, evaporating a calcium thin film layer on a substrate; S2, depositing a packaging thin film layer on the substrate through an atomic layer deposition layer under protective gas, enabling the calcium thin film layer to be covered with the packaging thin film layer to obtain a thin film device to be measured; and S3, testing the thin film device to be measured obtain in the step S2 by adopting a Kelvin four-probe method, obtaining a time-varying conductivity curve of the calcium thin film layer in the thin film device to be measured, and extracting the slope of a linear part of the curve: d(1 / R) / dt, and substituting into a next formula as shown in the specification to obtain the water vapor penetration rate of the thin film eta WVTR, wherein in the formula, n is water vapor penetration characteristic coefficient at the temperature of 25 DEG C, M(H2O) is the molar mass of water, M(Ca) is the molar mass of calcium, delta is calcium specific resistance, rho is calcium density, L is the length of the calcium thin film layer, and W is the width of the calcium thin film layer. The test precision can reach 1 * 10<-6> g * m<-2> * d<-1>, and the test method has the advantages of being quick, simple, high in accuracy and the like.
Owner:茆胜

Structure and method for measuring electric property change of MOSFET (metal-oxide-semiconductor field effect transistor) device

The invention provides a structure for measuring electric property change of MOSFET (metal-oxide-semiconductor field effect transistor) device, which comprises an active area, a grid electrode located on the active area, wherein the grid electrode is a resistor in Kelvin structure; two ends of the grid electrode have two polyresistor end points. The structure of the invention has the advantage that the influences of the grid length change, the gate oxide thickness change and the doping change to the MOSFET device are distinguished and determined; and the three process changes are the main factors of electrical fluctuations of device and are the primary parameters for building a monte carlo model and a corner mode of the device; the determination of the three process changes can lead the monte carlo model and the corner model to be more precise, which is quite important under the condition that the requirements on process corner models that is more than 90nm are higher and higher, and in favour of extracting a stress model of the device for placing numbers and distances of different virtual grid electrodes in more than 45nm of process. The invention further provides a method for measuring electric property change of MOSFET device.
Owner:SHANGHAI INTEGRATED CIRCUIT RES & DEV CENT

Method for reducing pH value of lithium ion electrode material

The invention relates to a method for reducing the pH value of a lithium ion electrode material. The method for reducing the pH value of the lithium ion electrode material comprises the following steps: a. arranging an electrode sample into a reaction cavity of an atom layer deposition instrument, vacuumizing and heating the temperature of a reaction chamber to 300-1000 Kelvin, keeping the electrode sample at the setting temperature for 5-30 minutes, wherein the air pressure in the reaction cavity is lower than 0.01 atmospheric pressure; b. switching on a gas discharge valve, and carrying out pulse sweeping on gas for 3-60 seconds; c. switching off the gas discharge valve, and pulsing a gaseous precursor A or the mixture of the precursor A and the carried gas; d. then switching on the gas discharge valve, and carrying out pulse sweeping gas, switching off the gas discharge valve, vacuumizing, and removing residual reaction byproducts; g. returning to the step c and executing the following steps repeatedly until the required coating thickness being 2-30 angstroms is achieved. According to the method, uniform metal oxide coatings can be formed uniformly on the surface of an electrode, and the pH value of the lithium ion electrode material can be reduced, so that the service life of the lithium battery is prolonged and the safety is improved, and the method for reducing the pH value of the lithium ion electrode material is worthy of being popularized and applied.
Owner:镇江智联德科技有限公司
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