A high-efficiency and high-quality chemical-mechanical polishing fluid for yttrium-aluminum garnet crystals
A technology of yttrium aluminum garnet and chemical machinery, which is applied in the direction of polishing compositions containing abrasives, can solve the problems of high cost, high cost of waste liquid treatment, and subsurface damage of fine scratches, and achieve low cost and crystal surface Effects of reduced roughness, scratches, and subsurface damage reduction
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[0018] The purpose of the present invention is to improve the surface quality of yttrium aluminum garnet crystal after polishing and the removal rate of chemical mechanical polishing materials, explore the influence of different components on the polishing effect, and then optimize the ratio of different components in the polishing liquid to finally obtain a polishing solution with excellent performance. Chemical mechanical polishing fluid. Specifically include the following steps:
[0019] 1) It is determined that zirconia with a particle size of 80nm is selected as the polishing liquid abrasive, and its dispersed particle size in the solution is as follows: figure 1 shown. Sodium silicate and magnesium oxide are used as chemical reaction reagents, and the concentrations are 0.05g / ml and 3g / L respectively.
[0020] 2) Prepare an aqueous solution containing 8% zirconia as polishing liquid 1 and a mixed aqueous solution containing 8% zirconia and 5% sodium silicate as polishi...
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