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Process data monitoring method and process data monitoring system

A process data and monitoring system technology, applied in registration/instruction quality control systems, manufacturing computing systems, data processing applications, etc., can solve problems such as difficult interaction and one-sided data monitoring methods, and achieve the effect of improving interception efficiency

Inactive Publication Date: 2019-07-26
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the data collection of automated factories is isolated, and the monitoring method of data is also one-sided. The interaction between data is difficult to be effectively monitored in the existing production mode of automated factories.

Method used

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  • Process data monitoring method and process data monitoring system

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Embodiment Construction

[0030] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0031] see figure 1 , the invention provides a process data monitoring method, comprising the steps of:

[0032] Step S1. Obtain multiple process data of the production equipment corresponding to the production of multiple display panels, and divide the multiple process data into multiple first process data that satisfy the normal distribution and multiple second process data that do not satisfy the normal distribution. process data;

[0033] Step S2, acquiring a plurality of key factors having differences between the plurality of first process data and the plurality of second process data;

[0034] Step S3, performing data fitting on a plurality of first process data corresponding to key factors to obtain a fitting curve;

[0035] Step S4....

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Abstract

The invention provides a process data monitoring method and a process data monitoring system. The method comprises dividng a plurality of pieces of process data for correspondingly producing a plurality of display panels into a plurality of pieces of first process data meeting normal distribution and a plurality of pieces of second process data not meeting normal distribution; obtaining a plurality of key factors with differences in the plurality of first process data and the plurality of second process data, carrying out data fitting on the plurality of first process data correspondingly generating the key factors, obtaining fitting curve, acquiring residual errors between all process data and the fitting curve; juding each process data to be normal process data or abnormal process data according to the residual error corresponding to each process data, so that the abnormal process data is effectively monitored, the display panel corresponding to each process data is judged to be a normal display panel or an abnormal display panel, and the interception efficiency of abnormal process products is improved.

Description

technical field [0001] The invention relates to the field of production technology, in particular to a process data monitoring method and a process data monitoring system. Background technique [0002] Thin Film Transistor (TFT) is the main driving element in current Liquid Crystal Display (LCD) and Active Matrix Organic Light-Emitting Diode (AMOLED). It is related to the display performance of the flat panel display device. [0003] Most of the liquid crystal displays currently on the market are backlight liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to pour liquid crystal molecules between the thin film transistor array substrate (ThinFilm Transistor Array Substrate, TFT Array Substrate) and the color filter (ColorFilter, CF) substrate, and apply pixel voltage on the two substrates respectively. and the common voltage, through the electric field formed between the...

Claims

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Application Information

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IPC IPC(8): G06Q10/06G07C3/14G07C3/00G06Q50/04
CPCG06Q10/06395G06Q50/04G07C3/005G07C3/146Y02P90/30
Inventor 谢剑星
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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