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Substrate processing device, substrate processing method, and program recording medium

A substrate processing device and technology for a substrate processing method are applied in chemical instruments and methods, cleaning methods and utensils, cleaning methods using tools, etc., and can solve the problems of difficult substrate end brushing, residual attraction marks, and inability to clean.

Active Publication Date: 2019-09-03
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The suction cup method exemplified in Patent Document 1 can freely brush and clean the end of the substrate, but on the other hand, there are problems such as that suction marks remain on the substrate, or that the part of the suction cup that is in contact with the substrate cannot be cleaned during suction, etc.
[0006] However, in the substrate holding of the edge holding method, since the ends of the substrates are held by chuck pins, there are problems such as difficulty in brushing the ends of the substrates.

Method used

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  • Substrate processing device, substrate processing method, and program recording medium
  • Substrate processing device, substrate processing method, and program recording medium
  • Substrate processing device, substrate processing method, and program recording medium

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Embodiment Construction

[0038] Hereinafter, the configuration and operation of the substrate processing apparatus 1 will be described with reference to the drawings.

[0039] In the drawings, parts having the same structure and function are given the same reference numerals, and repeated descriptions will be omitted in the following description. In addition, each drawing is a schematic drawing.

[0040]

[0041] figure 1 It is a schematic diagram which shows an example of the structure of the substrate processing apparatus 1 of embodiment.

[0042] First, various members or mechanisms constituting the substrate processing apparatus 1 will be described.

[0043]The substrate processing apparatus 1 includes a spin chuck 50 for holding and rotating a substrate W. As shown in FIG. The spin chuck 50 has a substantially disc-shaped spin base 70 , a cylindrical support shaft 52 connected below the spin base 70 , and a spin base rotation mechanism 53 connected to the support shaft 52 . The swivel base ...

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Abstract

A substrate processing device for brush-cleaning a substrate. The substrate processing device is provided with: a spin base provided so as to be capable of rotating about a rotation axis; a spin baserotation mechanism for rotating the spin base; and a plurality of first chuck pins capable of being switched between an open state and a closed state, the first chuck pins being configured so as to becapable of clamping the end parts of the substrate from the side surfaces thereof in a closed state and being provided to the spin base. Each of the plurality of first chuck pins is configured such that, in the closed state in which the first chuck pin clamps the end part of the substrate, the upper surface of the first chuck pin is at the same height as or lower than the upper surface of the substrate.

Description

technical field [0001] The present invention relates to a substrate processing apparatus and a substrate processing method for processing a substrate to be processed using a processing liquid. Furthermore, the present invention relates to a program recording medium on which a program for executing substrate processing by a substrate processing apparatus is recorded. The substrates to be processed include various substrates such as semiconductor wafers, glass substrates for liquid crystal display devices, glass substrates for plasma displays, photomask substrates, optical disk substrates, magnetic disk substrates, and magneto-optical disk substrates. Background technique [0002] One of the processing steps of the substrate is a step of cleaning the surface of the substrate by supplying a processing liquid to the surface of the substrate. When the purpose of cleaning cannot be sufficiently achieved by supplying only the treatment liquid, a brush cleaning step is performed in...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/304H01L21/683B08B1/20
CPCH01L21/67051H01L21/67046H01L21/67028H01L21/68728H01L21/68764H01L21/02096H01L21/02057H01L21/68721B08B1/12B08B1/20
Inventor 西田崇之石井淳一
Owner DAINIPPON SCREEN MTG CO LTD