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A reticle and equipment technology, applied in the field of reticle clamping equipment, can solve problems such as micro-slip

Active Publication Date: 2021-12-07
ASML HLDG NV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Additionally, when these Z supports have a non-zero stiffness factor, they also generate high pressure points at the fixture and reticle interface in the surrounding area, leading to microslip and corresponding overlay problems

Method used

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Embodiment Construction

[0027] This specification discloses one or more embodiments that incorporate the features of this disclosure. The disclosed embodiment(s) are merely illustrative of the disclosure. The scope of the present disclosure is not limited to the disclosed embodiment(s). The disclosure is defined by the appended claims.

[0028] Embodiment(s) are described and references in this specification to "one embodiment," "an embodiment," "example embodiment" etc. indicate that the described embodiment(s) may include particular features, structures, or characteristic, but not necessarily every embodiment includes that particular feature, structure, or characteristic. Additionally, these phrases are not necessarily referring to the same embodiment. In addition, when a particular feature, structure, or characteristic is described in conjunction with an embodiment, it should be understood that implementing such feature, structure, or characteristic in conjunction with other embodiments falls w...

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Abstract

Systems and methods are disclosed that provide a Z-direction support system for a patterning device that can operate at high accelerations and decelerations with minimal impact on X- and Y-direction travel and hysteresis. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple the reticle to the support device. The retention device includes a plurality of burls. The reticle holding system also includes a metal support system coupled to the support apparatus. A metal support system provides the vacuum path from the vacuum channel to the holding device.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to U.S. Provisional Patent Application No. 62 / 457,269, filed February 10, 2017, the entire contents of which are incorporated herein by reference. technical field [0003] The present disclosure relates to a reticle holding apparatus that may be used, for example, in a lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a target portion of a substrate. For example, lithographic apparatus can be used in the fabrication of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, can be used to generate a circuit pattern corresponding to the corresponding layer of the IC, and this pattern can be imaged onto a layer of radiation-sensitive material (anti- etchant) on a target portion (including a portion of one or more dies) on a substrate (eg, a silicon wafer). ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/707G03F7/70258G03F7/70825G03F7/70741
Inventor E·佐丹B·A·埃文斯D·N·伯班克A·R·巴赫蒂S·A·内费
Owner ASML HLDG NV