Novel chemical liquid phase deposition furnace
A chemical liquid deposition and liquid deposition technology, which is applied in the field of new chemical liquid deposition furnaces, can solve the problems of uncontrollable density of preforms, limited preform size, and excessive equipment power configuration, and achieves short-term, The effect of improving work efficiency and low energy consumption
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[0042] The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.
[0043] The new chemical liquid phase deposition furnace can realize the relative movement of the preform and the induction coil and the local induction heating deposition, the furnace body is vacuumed, the protective gas is introduced during operation, the supply of the precursor in the precursor tank, and the condensation recovery of the precursor.
[0044] see Figure 1-Figure 2 , the process of putting the prefabricated body into the device is described as follows:
[0045] Put the prefabricated body 13 on the support 1, and after the air in the furnace is evacuated through the vacuum port 7, the protective gas is filled. In this embodiment, the protective gas is...
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