The loading and unloading device of the medium window and the process chamber

A technology for loading and unloading devices and process chambers, applied in the direction of discharge tubes, electrical components, circuits, etc., can solve the problems of limited maintenance space for adjacent machines, potential safety hazards, scrapped media windows, etc., to reduce labor costs and replace media The cost of the window, the effect of saving manpower and material resources, and reducing the cost of cleaning

Active Publication Date: 2022-05-27
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The material of the dielectric window is usually quartz or ceramics, the weight is more than 20 kilograms, and the price is relatively expensive.
However, the current installation and disassembly are all completed by manual lifting. Since the maintenance space between adjacent machines is very limited, accidents are prone to occur during the disassembly process, which not only poses safety hazards, but also causes scrapping of the media window.

Method used

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  • The loading and unloading device of the medium window and the process chamber
  • The loading and unloading device of the medium window and the process chamber
  • The loading and unloading device of the medium window and the process chamber

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Embodiment Construction

[0026] The application is described in detail below, and examples of embodiments of the application are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar components or components having the same or similar functions throughout. Also, detailed descriptions of known technologies are omitted if they are not necessary for illustrating features of the present application. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, but not to be construed as a limitation on the present application.

[0027] It will be understood by those skilled in the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. It should also be understood that terms, such as those defined in a g...

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PUM

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Abstract

The invention provides a loading and unloading device for a medium window and a process chamber. The loading and unloading device for a medium window includes: a lifting structure for lifting the medium window; a lifting drive mechanism connected with the lifting structure for driving the lifting structure to lift and level Move to realize the installation or removal of the media window. The application of the present invention can not only save a lot of manpower and material resources, improve the efficiency of loading and unloading, but also effectively reduce the potential safety hazards caused by manual handling and the scrapping of parts, thereby reducing labor costs and the cost of replacing medium windows; and can reduce the cost of medium The probability of window bumping can be reduced, thereby avoiding the impact of broken particles entering the chamber on the process, and reducing the cost of post-cleaning; in addition, the hoisting drive mechanism can provide greater lifting force, which can better offset the gap between the medium window and the lower sealing ring Excellent adhesion, reducing the difficulty of removing the media window.

Description

technical field [0001] The present invention relates to the technical field of semiconductors, and in particular, to a device for loading and unloading a dielectric window and a process chamber. Background technique [0002] At present, in the manufacturing process of integrated circuits, the etching machine is an indispensable equipment. Its working principle is: the radio frequency passes through the coil, and is introduced into the process chamber through the dielectric window, and the process gas in the process chamber is excited into plasma for use in in process etching. Among them, the dielectric window is an important medium for the radio frequency to enter the chamber. After it is used for a period of time, it needs to be replaced because it is bombarded by plasma for a long time. The material of the dielectric window is usually quartz or ceramic, the weight is more than 20 kilograms, and the price is relatively expensive. However, the current installation and disa...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32H01L21/67
CPCH01L21/67069H01J37/32119
Inventor 马恩泽
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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