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Method for producing electrolyte composition containing metal and silicon in plasma electrolytic oxidation process and dental implant

A technology of plasma electrolysis and manufacturing method, applied in dental preparations, dentistry, dental implants, etc., can solve the problems of shortening the treatment time of bone tissue and insufficient biocompatibility, shortening the treatment period, increasing the biocompatibility, improving the Effect of initial fixation force

Active Publication Date: 2021-10-22
IND ACADEMIC CORP FOUND YONSEI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, problems such as the inability to induce regeneration of adjacent bone tissue and shortened treatment time due to problems such as the rapid disappearance of the oxide film in the conventional technology have been partially improved, and the problems of the past are still contained.
[0010] Looking at the above-mentioned prior art, an oxide film is formed on the surface of the titanium alloy, and the electrolyte solution used in the plasma electrolytic oxidation process contains β-tricalcium phosphate and potassium dihydrogen phosphate (KH 2 PO 4 ) and calcium chloride (CaCl 2 ), etc., are composed of a structure that changes voltage and current density, etc., and form a porous surface of an oxide film on the surface of a dental implant formed only of conventional titanium-based alloys, improve bioactivity, and induce bone cell adhesion and osseointegrated growth faster , but as a metabolic process and an element formed by bone, the factors contained in the above electrolyte solution have insufficient biocompatibility

Method used

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  • Method for producing electrolyte composition containing metal and silicon in plasma electrolytic oxidation process and dental implant
  • Method for producing electrolyte composition containing metal and silicon in plasma electrolytic oxidation process and dental implant
  • Method for producing electrolyte composition containing metal and silicon in plasma electrolytic oxidation process and dental implant

Examples

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Embodiment

[0074] Example: Production of dental implants coated with hydroxyapatite containing metal ions and silicon ions according to the plasma electrolytic oxidation process

[0075] Utilize silicon carbide sandpaper to grind Ti-6Al-4V disc (grade 5, Timet Co.Ltd, Japan (diameter) (diameter); 10mm, thickness (thickness); 3mm) sample, specifically utilize by 100, 600, Sandpaper composed of 800, 1200, and 2000grit is ground in stages, using aluminum oxide (Al 2 o 3 ) after microgrinding and ultrasonic cleaning, each magnesium ion, zinc ion, strontium ion and manganese ion in the electrolytic solution (each 1 L of distilled water) accounted for 5, 10, 20 mol% relative to calcium ion, and silicon ion relative to Phosphorus ions account for 5 mol%. Like the designs described in the following Table 1 (magnesium), Table 2 (zinc), Table 3 (strontium) and Table 4 (manganese), weigh calcium acetate monohydrate (Calcium acetatemonohydrate), glycerophosphoric acid Calcium glycerophosphate, Mag...

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Abstract

The invention discloses an electrolyte composition and a method for manufacturing dental implants, wherein the electrolyte composition comprises calcium acetate monohydrate, calcium glycerophosphate, sodium metasilicate nonahydrate, distilled water and a metal compound to form an electrolyte solution The metal compound is one of magnesium acetate tetrahydrate, zinc acetate, strontium acetate and manganese acetate; the present invention is thicker and denser than the previous metal oxide film, and contains biologically active substances of metal ions and silicon ions. , rapidly increase the biocompatibility, thereby improving the initial fixation force of dental implants to shorten the treatment period.

Description

technical field [0001] The present invention generally forms a porous oxide film on the surface of a titanium-based alloy, a metal material used in a bone inserted into the human body, by plasma electrolytic oxidation (Plasma Electrolytic Oxidation). More specifically, it relates to the process of plasma electrolytic oxidation containing Electrolyte composition of metal and silicon and method for producing dental implant coated with hydroxyapatite containing metal ions and silicon ions using the composition, using An electrolyte solution of metals (magnesium, zinc, strontium, manganese) and silicon that play an important role in cell adhesion and bone formation, on the surface of dental implants, formed by plasma electrolytic oxidation containing metal ions and silicon ions and calcium and phosphorus The surface of the porous oxide film is used to improve the biological activity of the dental implant manufacturing method. The process includes: titanium alloy preparation step, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): A61C13/00A61C8/00A61L27/06A61L27/32A61K6/838A61K6/84
CPCA61C8/00A61C13/00A61L27/06A61L27/32A61K6/838A61K6/84
Inventor 崔汉喆朴宣映黃仁照刘智旻姜貞仁
Owner IND ACADEMIC CORP FOUND YONSEI UNIV
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