High-isolation and high-gain dual-unit microstrip antenna and manufacturing method thereof

A high-isolation, microstrip antenna technology, applied in antennas, antenna couplings, antenna arrays, etc., can solve the problems of poor isolation of microstrip antennas in unit arrays and low gain of microstrip antennas, and achieve improved radiation directivity, The effect of low production cost and reduced half-power beam width

Inactive Publication Date: 2019-12-03
CHANGAN UNIV
View PDF6 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the disadvantages of the low gain of the microstrip antenna and the poor isolation of the unit array microstrip antenna in the above-mentioned prior art, and provide a high-isolation high-gain dual-element microstrip antenna and its manufacturing method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-isolation and high-gain dual-unit microstrip antenna and manufacturing method thereof
  • High-isolation and high-gain dual-unit microstrip antenna and manufacturing method thereof
  • High-isolation and high-gain dual-unit microstrip antenna and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0061] First, the parameter information in this embodiment is explained:

[0062] The length of the first dielectric substrate 2 and the second dielectric substrate 5 are both Ls=135.8mm, and the width is Ws=79mm; the inner side length, line width, opening and lattice constant (resonant ring distance) of the split resonator ring 1 are respectively a=11mm, w=1mm, g=1mm, d=15mm; the thickness of the metal grounding plate 10 is 35um. Both the first dielectric substrate 2 and the second dielectric substrate 5 are epoxy resin (FR4) substrates with a thickness of 1.6mm, the dielectric constant is 4.4, and the dielectric loss tangent is tanδ=0.02; the first dielectric substrate 2 and the two-unit rectangular patch The distance between the antennas 6 is 74mm, forming an air cavity 3; the width of the two-element rectangular patch antennas 6 is Wp=34.8mm, and the width Lp=28.1mm. The design of the Wilkinson power divider 7 is relatively complicated. It is composed of 4 sections of fee...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the field of microstrip antennas, and discloses a high-isolation and high-gain dual-unit microstrip antenna and a manufacturing method thereof. The antenna comprises a first dielectric substrate, a second dielectric substrate, a Wilkinson power divider and a SMA coaxial connector. The first dielectric substrate is connected with the second dielectric substrate, and locatedabove the second dielectric substrate. An air cavity is arranged between the first dielectric substrate and the second dielectric substrate. An open resonance ring array is arranged on the upper surface of the first dielectric substrate. Two unit rectangular patch antennas are arranged on the upper surface of the second dielectric substrate. A metal ground plate is arranged on the lower surface.One end of the Wilkinson power divider is connected with two unit rectangular patch antennas, and the other end is connected with the SMA coaxial connector. The SMA coaxial connector is connected withthe metal ground plate. Two unit rectangular patch antennas are isolated by the Wilkinson power divider, which reduces mutual coupling interference between two unit rectangular patch antennas. The lateral radiation of the microstrip antenna is reduced through the open resonance ring array. The radiation gain and the directivity are improved.

Description

technical field [0001] The invention belongs to the field of microstrip antennas, and relates to a high-isolation high-gain dual-element microstrip antenna and a manufacturing method thereof. Background technique [0002] In a wireless communication system, the antenna is the most critical component in the communication system, which determines the quality of wireless communication. Therefore, the development of high-performance antennas is an issue of widespread concern in academia and engineering. For different application scenarios, The choice of antenna is also different. The communication in the 2.45GHz ISM frequency band is mainly open to industrial, scientific and medical institutions, and the application does not require licenses or fees. Therefore, wireless LAN (IEEE 802.11b / IEEE 802.11g), Bluetooth, ZigBee and other wireless networks can all work at 2.45GHz. [0003] Microstrip antennas are widely used in the above-mentioned practical engineering applications due ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01Q1/52H01Q1/50H01Q1/38H01Q15/00H01Q21/00H01Q21/29H01P5/16
CPCH01P5/16H01Q1/38H01Q1/50H01Q1/523H01Q15/0086H01Q21/0087H01Q21/293
Inventor 靳钊蔺琛智高尧乔丽萍郭晨贺之莉
Owner CHANGAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap