Beam rotator unit and laser processing apparatus
A laser processing and rotator technology, which is applied in laser welding equipment, metal processing equipment, manufacturing tools, etc., can solve the problem that there is no taper-free nesting processing, and cannot be obtained.
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Embodiment 1
[0063] In this embodiment, an alumina ceramic plate with a thickness of 0.62 mm is drilled with a diameter of 200 μm. The specific processing conditions are as follows.
[0064] Laser conditions→wavelength=532nm, pulse width<50ps, repetition frequency=100kHz, output power=7.5W;
[0065] Speed of beam rotator=10000rpm;
[0066] Z-axis feed pitch = 12μm.
[0067] Figure 5 This is a diagram showing an enlarged image of the through hole obtained by processing. Figure 5 (A) is an image observed from the side of the through hole after cutting the alumina ceramic plate from the cross section through the through hole. Figure 5 (B) is an image of the surface of the alumina ceramic plate after the cutting.
[0068] From Figure 5 It can be confirmed that the taper through hole is well formed.
Embodiment 2
[0070] In this embodiment, a SiC plate with a thickness of 0.36 mm is drilled with a diameter of 300 μm. The specific processing conditions are as follows.
[0071] Laser conditions→wavelength=532nm, pulse width<15ns, repetition frequency=80kHz, output power=4.0W;
[0072] Speed of beam rotator=5000rpm;
[0073] Z-axis feed pitch = 20μm.
[0074] Image 6 This is a diagram showing an enlarged image of the through hole obtained by processing. Image 6 (A) is an image observed from the side of the through hole after the SiC plate is cut from the cross section through the through hole. Image 6 (B) is an image of the surface of the SiC plate after the through hole is formed.
[0075] From Image 6 It can be confirmed that the taper through hole is well formed.
Embodiment 3
[0077] In this embodiment, a Si plate with a thickness of 0.49 mm is drilled with a diameter of 500 μm. The specific processing conditions are as follows.
[0078] Laser conditions→wavelength=532nm, pulse width<15ns, repetition frequency=50kHz, output power=7.5W;
[0079] Speed of beam rotator=5000rpm;
[0080] Z axis feed pitch = 60μm.
[0081] Figure 7 This is a diagram showing an enlarged image of the through hole obtained by processing. Figure 7 (A) is an image observed from the side of the through hole after the Si plate is cut from the cross section through the through hole. Figure 7 (B) is an image of the surface of the Si plate after the through hole is formed.
[0082] From Figure 7 It can be confirmed whether the through hole with taper is well formed
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