Unlock instant, AI-driven research and patent intelligence for your innovation.

Perpendicular inductors integrated in a substrate

A technology of inductors and inductor windings, applied in the direction of inductors, fixed inductors, printed inductors, etc., can solve the problem of increasing the electromagnetic interference of the first inductor

Active Publication Date: 2020-09-22
QUALCOMM INC
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this is undesirable as it increases the electromagnetic interference between the first inductor 110, the second inductor 112 and the third inductor 114

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Perpendicular inductors integrated in a substrate
  • Perpendicular inductors integrated in a substrate
  • Perpendicular inductors integrated in a substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] In the following description, specific details are given to provide a thorough understanding of various aspects of the present disclosure. However, it will be understood by those of ordinary skill in the art that the various aspects may be practiced without these specific details. For example, circuits may be shown in block diagrams in order not to obscure aspects in unnecessary detail. In other instances, well-known circuits, structures and techniques may not have been shown in detail in order not to obscure aspects of the present disclosure.

[0024] overview

[0025] Some features relate to the first and second inductors being integrated into the substrate. The second inductor is embedded in the first inductor. The second inductor is perpendicular to the first inductor. The first inductor is configured to generate a first magnetic field, and the second inductor is configured to generate a second magnetic field. Because the second inductor is perpendicular to the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Some features pertain to a substrate, and a first inductor integrated into the substrate. The first inductor includes a plurality of first inductor windings in a first metal layer and a second metal layer. A second inductor is integrated into the substrate. The second inductor includes a first spiral in a third metal layer. The first spiral is located at least partially inside the plurality of first inductor windings, wherein the second inductor is perpendicular to the first inductor.

Description

[0001] Cross References to Related Applications [0002] This patent application claims Provisional Application No. 62 / 629,345, filed February 12, 2018, entitled "PERPENDICULAR INDUCTORS INTEGRATED IN A SUBSTRATE," and filed January 23, 2019, entitled "PERPENDICULAR INDUCTORS INTEGRATED IN A SUBSTRATE" Priority of non-provisional application No. 16 / 254,735, assigned to the assignee herein and expressly incorporated herein by reference. technical field [0003] Various features relate to vertical inductors integrated in the substrate. Background technique [0004] Integrated circuits, substrates, and electronic devices are constantly being driven to smaller form factors. Devices such as inductors and duplexers are integrated into the substrate to save space. As the form factor of the substrate decreases, there are challenges in making the inductors and duplexers smaller. In addition, electromagnetic interference between such devices is also a challenge. [0005] Figure...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01F17/00H01F17/02H01L23/52H10N97/00
CPCH01F17/0013H01F17/02H01F2017/002H01F2017/0073H01L28/10H01L23/5227H01L23/49822H01F2027/2809H01F27/2804H01F41/042H01L23/645
Inventor 张舒D·D·金姆淦辰乾B·具B·内亚蒂
Owner QUALCOMM INC
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More