Konjak acne-removing mask and preparation method thereof

A mask and anti-acne technology, which is applied in the field of konjac anti-acne mask and its preparation, can solve the problems of affecting pore breathing and relaxation, difficulty in absorbing nutrients, and no anti-acne effect, so as to improve the curative effect of anti-acne and enhance the penetrating power , good adhesion effect

Pending Publication Date: 2020-10-09
EZHOU INST OF IND TECH HUAZHONG UNIV OF SCI & TECH +1
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This mask has good anti-oxidation ability, but the air permeability is not good, which affects the breathing and relaxation of pores, and it is difficult to absorb nutrients; and it has no acne-removing effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Konjak acne-removing mask and preparation method thereof
  • Konjak acne-removing mask and preparation method thereof
  • Konjak acne-removing mask and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0049] According to another typical embodiment of the present invention, a kind of preparation method of konjac acne mask is provided, such as figure 1 As shown, the method includes:

[0050] S1, 20-30 parts of konjac micropowder in parts by weight, 80-100 parts of deionized water, 2-3 parts of gelatin, 2-3 parts of sodium carboxymethylcellulose and 10-20 parts of pearl powder part, stirring and dissolving under the condition of 45°C to 55°C to obtain konjac micropowder aqueous solution;

[0051] S2, the konjac micropowder aqueous solution is poured into the mask film tool and left still, after dehydration, obtain the mask sheet;

[0052] S3. In parts by weight, pulverize and mix 6-10 parts of Atractylodes Rhizoma Atractylodes Root, 6-10 parts of Baizhi Root, and 3-5 parts of Astragalus Root, and then add ethanol for reflux extraction, and then separate solid and liquid to obtain A liquid and slag; add 10 to 20 parts of crushed aloe vera leaves to the slag, decoct with water...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
Login to view more

Abstract

The invention discloses a konjak acne-removing mask. The konjak acne-removing mask comprises a mask sheet and nano-scale beautifying liquid; the mask sheet comprises the following components in partsby weight: 20-30 parts of konjak micro powder, 80-100 parts of deionized water, 2-3 parts of gelatin, 2-3 parts of sodium carboxymethyl cellulose and 10-20 parts of pearl powder; the nanoscale beautifying liquid comprises the following components in parts by weight: 2-3 parts of powder A, 4-6 parts of powder B, 100-200 parts of deionized water, 0.1-0.2 part of sodium alginate and 0.1-0.2 part of sodium carboxymethyl cellulose; the preparation method of the powder A and the powder B comprises the steps that 6-10 parts of atractylodes macrocephala roots, 6-10 parts of radix angelicae roots and 3-5 parts of astragalus roots are smashed and evenly mixed to obtain a mixture, then solid-liquid separation is conducted after extraction, and a solution A and residues are obtained; 10-20 parts of aloe leaves are added into the residues, water is added for decocting and carrying out solid-liquid separation to obtain a solution B; respectively the solution A and the solution B are concentrated into paste to obtain powder A and powder B.

Description

technical field [0001] The invention relates to the technical field of facial mask preparation, in particular to a konjac acne-removing facial mask and a preparation method thereof. Background technique [0002] Facial acne, commonly known as pimples, is a common skin disease that occurs in adolescents and adults with exuberant body fat secretion. Acne is due to the strong secretion of facial sebaceous glands, the stratum corneum is detached, and after mixing with external oil and dirt, the pores are blocked, causing chronic inflammatory skin diseases on the surface of the face, and in severe cases, it will cause hyperplasia of pigment cells, leaving pigmented scars that are difficult to eliminate , affecting the appearance of the patient. [0003] Western medicine often adopts retinoic acid drugs for oral administration and hormone anti-inflammatory drugs for external use to treat facial acne, but these drugs are highly effective and irritating, and often coexist with many...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/98A61K8/9789A61K8/9794A61K8/73A61K36/886A61K36/896A61Q19/00A61P29/00A61P17/10
CPCA61K8/731A61K8/733A61K8/987A61K36/232A61K36/284A61K36/481A61K36/886A61K36/896A61K2800/413A61K2800/5922A61Q19/00A61K8/9789A61K8/9794A61P17/10A61P29/00A61K2300/00
Inventor 卢群伟李红安唐和斌
Owner EZHOU INST OF IND TECH HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap