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Double-layer mask plate, using method thereof and method for improving light leakage of double-layer mask plate

A mask, light leakage technology, applied in the field of exposure, can solve problems such as the inability to adjust to the same

Active Publication Date: 2020-10-30
NANJING CEC PANDA FPD TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the illuminance deviates, the output ratio of the light source (actual power output) will be adjusted, or the height of the light source position will be adjusted, but it cannot be adjusted to be consistent. The current illuminance control method is the central value ± 5%, that is, there is a 5% error

Method used

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  • Double-layer mask plate, using method thereof and method for improving light leakage of double-layer mask plate

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Embodiment Construction

[0041] Below in conjunction with accompanying drawing and specific embodiment, further illustrate the present invention, should be understood that these embodiments are only for illustrating the present invention and are not intended to limit the scope of the present invention, after having read the present invention, those skilled in the art will understand various aspects of the present invention Modifications in equivalent forms all fall within the scope defined by the appended claims of this application.

[0042]In order to make the drawing concise, each drawing only schematically shows the parts related to the present invention, and they do not represent the actual structure of the product. In addition, to make the drawings concise and easy to understand, in some drawings, only one of the components having the same structure or function is schematically shown, or only one of them is marked. Herein, "a" not only means "only one", but also means "more than one".

[0043] T...

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Abstract

The invention provides a double-layer mask plate and a using method thereof, and a method for improving light leakage of a double-layer mask plate, which are used for an ultraviolet light vertical alignment technology. The double-layer mask plate comprises a first mask plate and second mask plates; the first mask plate comprises a shading area, and a first light leakage pattern area and a second light leakage pattern area which are oppositely arranged; and the two second mask plates are lightproof, one second mask plate is located on the left side of the first light leakage pattern area and can cover the left side part of the first light leakage pattern area, and the other second mask plate is located on the right side of the second light leakage pattern area and can cover the right side part of the second light leakage pattern area. By the adoption of the double-layer mask plate, the function of adjusting the exposure amount is achieved; the opening rate of the mask plate of the ultraviolet light vertical alignment technology is adjusted, the consistency of the ultraviolet light exposure light accumulation amount is achieved, and the problem of exposure chromatic aberration is solved; and various requirements can be met, a mask does not need to be purchased additionally, and the cost can be reduced.

Description

technical field [0001] The invention relates to the technical field of exposure, in particular to a double-layer mask and a method for using the same, and a method for improving the light leakage of the double-layer mask. Background technique [0002] There are three main display modes of TFT-LCD (Thin film transistor liquid crystal display, thin film transistor liquid crystal display): TN (Twisted Nematic twisted nematic type), VA (Vertical Alignment multi-quadrant vertical alignment type) and IPS (In-Plane- Switching plane switching type). Among them, the TN display mode is the most basic and common display mode. It is easy to manufacture, has high transmittance, and low cost. It is widely used in small and medium-sized LCD products such as displays below 26 inches, notebook computers, and mobile phones. The box-making process mainly includes alignment film printing (PI), rubbing alignment (Rubbing) and drop lamination and other projects. The IPS display mode has become ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1337
CPCG02F1/133788
Inventor 周皇刘志诚马国永胡硕邵军亮郭理超
Owner NANJING CEC PANDA FPD TECH CO LTD