Quartz parts regenerative cleaning method for semiconductor high-level process apc device
A semiconductor, high-end technology, applied in the field of cleaning, can solve the problems of corrosion of quartz body and long time
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[0036] The present invention will be further described below in conjunction with the accompanying drawings.
[0037] see Figure 1 to Figure 5 , the regeneration method of semiconductor APC equipment quartz part (gas distribution plate) in this embodiment, comprises the steps:
[0038] Step 1, micropowder blasting;
[0039] Use the gas protection jig for sand blasting, and perform WA400# micro-powder sand blasting on the quartz parts to remove the residue or deposits on the surface. The delivery gas pressure used is 0.5-1Kg.cm 2 , sandblasting time 3-5 minutes;
[0040] Step 2, physical grinding and polishing;
[0041] Use a rotating platform and a certain sieved silicon carbide abrasive to grind a specific area. Through multiple grindings of a variety of sieved silicon carbide abrasives (coarse first and then fine), the surface roughness of the quartz part is lower than 1.0um, and the turntable Speed 30-75rmp;
[0042] Step three, flame polishing;
[0043] Oxygen-hydr...
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