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Dual load lock chamber

A load lock, chamber technology, applied in the field of multi-chamber processing systems, can solve the problem of reducing production

Pending Publication Date: 2020-12-11
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, traditional load-lock chambers can reduce throughput at each station in a cluster tool multi-chamber system (e.g., two or four chambers)

Method used

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Embodiment Construction

[0015] A dual load lock chamber for a multi-chamber processing system is disclosed herein. The inventive dual load lock chamber is configured to allow unloading of two or more substrates from the dual load lock chamber and loading of two or more substrates into the dual load lock chamber in one pass by a multi-substrate transfer robot chamber. As a result, the throughput of the multi-chamber processing system is advantageously increased.

[0016] The multi-chamber processing systems disclosed herein may be part of a cluster tool having several multi-chamber processing systems coupled thereto, such as, for example, figure 1 The processing system 100 illustrated in FIG. refer to figure 1 , in some embodiments, the processing system 100 may generally include a vacuum tight processing platform 104 , a factory interface 102 , one or more multi-chamber processing systems 101 , 103 , 105 , 107 , 109 , 111 , and a system controller 144 . Non-limiting examples of processing systems...

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Abstract

Dual load lock chambers for use in a multi-chamber processing system are disclosed herein. In some embodiments, a dual load lock chamber, includes a first load lock chamber having a first interior volume and a first substrate support, wherein the first substrate support includes a first plurality of support surfaces vertically spaced apart by a first predetermined distance; at least one heat transfer device disposed within the first substrate support to heat or cool the first plurality of substrates; and a second load lock chamber disposed adjacent to the first load lock chamber and having a second interior volume and a second substrate support, wherein the second substrate support includes a second plurality of support surfaces vertically spaced apart by a second predetermined distance that less than the first predetermined distance.

Description

technical field [0001] Embodiments of the present disclosure relate generally to substrate processing systems, and more particularly to methods and apparatus for multi-chamber processing systems. Background technique [0002] Processing systems, such as, for example, cluster tools with multiple processing chambers coupled to a shared transfer chamber, are used to reduce system and manufacturing costs, and to increase processing throughput. One or more load lock chambers facilitate the passage of substrates into and out of the factory interface and the shared transfer chamber. [0003] However, conventional load lock chambers can reduce throughput at each station in a cluster tool multi-chamber system (eg, dual or four chambers). In this system, the load lock may act as a bottleneck because the transfer robot in the shared transfer chamber may need to make many trips between the load lock chamber and each multi-chamber system to facilitate transfer of substrates Transport i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/677H01L21/683
CPCH01L21/67201H01L21/67109H01L21/67103H01L21/67742H01L21/67754H01L21/67207H01L21/6719H01L21/67253H01L21/67276H01L21/67098H01L21/683Y10S901/36B25J15/0616H01L21/68707
Inventor 迈克尔·R·赖斯
Owner APPLIED MATERIALS INC