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Photoresist granularity testing device

A test device and photoresist technology, which is applied in the field of photoresist, can solve problems such as inaccurate test data and unstable flow, and achieve the effects of improving reliability and repeatability, improving test accuracy, and simplifying operations

Pending Publication Date: 2021-04-06
NINGBO NATA OPTO ELECTRONICS MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The embodiment of the present invention provides a photoresist particle size test device, which aims to solve the problem of inaccurate test data caused by bubbles in the existing photoresist test pipeline due to pressure difference and unstable flow.

Method used

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Experimental program
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Embodiment 1

[0032] Such as figure 1 As shown, the present invention provides a photoresist particle size testing device, comprising, a head tank 10, connected with the photoresist production line for storing the photoresist to be tested; a particle analyzer 20, used to measure the photoresist to be tested Particle size; the bottom of the head tank 10 is provided with a feed port 11 connected to the pipeline of the photoresist production line; the side of the head tank 10 is provided with a discharge port 12 connected to the feed pipeline of the particle meter; the outlet of the particle meter 20 There is also a flow meter 30 for adjusting the photoresist flow parameters to be measured in the particle analyzer 20 at the end.

[0033] In this embodiment, the discharge port 12 is provided under the side of the elevated tank 10 to ensure that the photoresist to be measured flowing into the elevated tank flows stably into the particle analyzer 20 under the action of its own gravity.

[0034] ...

Embodiment 2

[0038] Such as figure 1 As shown, on the basis of the first embodiment, the top of the elevated tank 10 in this embodiment also has an air inlet 14 for inputting nitrogen.

[0039] Further, the air inlet 14 is connected with an air inlet device for delivering nitrogen gas into the elevated tank 10 .

[0040] When the photoresist liquid to be tested flows in the pipeline, tiny air bubbles will be generated due to the pressure difference of the pipeline. After passing through the particle analyzer, these small air bubbles will cause the instrument to report errors and affect the test results, so the test pipeline needs to be emptied.

[0041] Compared with the existing exhaust operation of opening a vent hole on the feed pipeline, when the operation is improper, the problem of photoresist leakage or pollution is prone to occur. In this embodiment, the air bubbles in the photoresist to be tested are discharged through the input of nitrogen gas through the air inlet 14 on the to...

Embodiment 3

[0044] On the basis of embodiment one or two, in this embodiment, an overflow port 13 is provided above the side of the elevated tank 10, for reclaiming the photoresist to be measured due to the large flow rate overflowing, the position of the overflow port 13 Higher than the discharge port 12 position.

[0045] Further, the overflow port 13 is connected with a storage tank for recovering overflowed photoresist to be tested through an overflow pipeline. In this embodiment, the photoresist to be measured flows into the particle analyzer through the discharge port 12, and the flow rate of the photoresist to be measured into the particle meter is adjusted and controlled by the gravity of the photoresist to be measured in the header tank 10 and the flow meter. , to keep its flow steady. The photoresist to be tested that is higher than the discharge port 12 flows into the storage tank through the overflow port 13 .

[0046] The photoresist particle size testing device of this emb...

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Abstract

The invention is applicable to the technical field of photoresist testing, and provides a photoresist granularity testing device, which comprises: an elevated tank connected with a photoresist production line and used for storing photoresist to be tested; a particle instrument which is used for measuring the granularity of the photoresist to be tested; a feeding hole which is formed in the bottom of the elevated tank; a discharge hole which is formed in the side lower part of the elevated tank; and a flow meter which is also arranged at the outlet end of the particle instrument. According to the photoresist granularity testing device disclosed by the embodiment of the invention, the photoresist to be tested enters the particle instrument at a stable flow rate through the simultaneous action of the gravity of the photoresist to be tested in the elevated tank and the flow meter at the outlet end, so that the operation is simplified, and the testing precision is improved. The problem that an instrument is easy to report errors due to unstable flow during photoresist granularity testing is solved; and compared with an existing method that real-time adjustment is needed at the inlet end through a valve, operation is simplified, repeatable operability is high, the granularity detection time during photoresist product production is greatly shortened, and the data reliability and repeatability are improved.

Description

technical field [0001] The invention belongs to the technical field of photoresist, in particular to a photoresist particle size testing device. Background technique [0002] Particle size is a key indicator in the production of advanced photoresist products, reflecting the cleanliness of photoresist, and generally needs to control particles with a precision of 0.15 microns. The mass production of photoresist requires the particle size to be stable in different batches. The low particle size can ensure that the chip will not be contaminated by the photoresist during the manufacturing process, reduce the generation of defects, and improve the yield rate and circuit performance of the chip. Whether the particle size control can be stably achieved in large-scale production is one of the keys to the success of the industrialization of advanced photoresist products. [0003] The particle size control of photoresist products is inseparable from professional analysis equipment. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N15/02
CPCG01N15/02
Inventor 顾大公陈玲马新龙许东升许鹏陈阳胡海斌毛智彪许从应
Owner NINGBO NATA OPTO ELECTRONICS MATERIAL CO LTD
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