Manufacturing method of anti-glare cover plate

A manufacturing method and anti-glare technology, applied in chemical instruments and methods, surface etching compositions, etc., can solve the problems of poor anti-glare effect and visual fatigue of anti-glare cover plates, achieve uniform frosting etching effect, and eliminate unevenness. Sensation, the effect of the smooth surface of the substrate

Pending Publication Date: 2021-04-16
GUANGDONG XIAOTIANCAI TECH CO LTD
View PDF3 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of this application is to provide a method for manufacturing an anti-glare cover, which aims to solve the technical problem that the anti-glare cover obtained by the traditional method has poor anti-glare effect, and the user is prone to visual fatigue after long-term visual inspection

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacturing method of anti-glare cover plate
  • Manufacturing method of anti-glare cover plate
  • Manufacturing method of anti-glare cover plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] In order to make the purpose, technical solution and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, not to limit the present application.

[0033] It should be noted that when a component is referred to as being “fixed on” or “disposed on” another component, it may be directly or indirectly located on the other component. When an element is referred to as being "connected to" another element, it can be directly or indirectly connected to the other element. The terms "upper", "lower", "left", "right", "front", "rear", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. The indicated orientation or position is based on the orientation or position shown in the drawings, and is only for convenience of description, a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention is applicable to the technical field of anti-dazzle, and provides a manufacturing method of an anti-dazzle cover plate, which sequentially comprises the following steps: a cutting step: cutting a substrate according to a preset spatial form, a preprocessing step: adopting a hydrofluoric acid solution with the first preset mass concentration for cleaning the substrate, and then adopting flushing liquid for flushing the substrate; a frosting etching step: immersing the substrate into a frosting etching solution, taking out the substrate after immersing for a first preset time, and then washing the substrate with a washing solution; an acid pickling step: immersing the substrate into an acid pickling solution with a second preset mass concentration, and taking out the substrate after immersing for a second preset time; a polishing step: spraying the substrate with a hydrofluoric acid polishing solution with a third preset mass concentration for a third preset time; flushing the substrate with flushing fluid, and drying the substrate. Through preprocessing, the frosting etching effect of the substrate is uniform; the frosted surface is prevented from being damaged in the polishing process through spraying and polishing, and the anti-dazzle effect is ensured; by controlling the flushing position and flow of the polishing solution, the polishing depth of the surface of the substrate can be controlled in different areas.

Description

technical field [0001] The present application relates to the field of anti-glare technology, in particular to a method for manufacturing an anti-glare cover. Background technique [0002] In the range observed by the human eye, when there is an extreme brightness contrast in space or time, it is easy to cause visual discomfort and reduce the ability of the human eye to observe, which is often called glare. High-intensity or long-lasting glare may cause psychological disgust, physical discomfort, and even temporary or permanent loss of vision. Devices are often equipped with anti-glare structures or programs. [0003] For the anti-glare cover used by the display screen, the traditional solution discloses a solution for treating the surface of the anti-glare cover so that the original plane becomes a matte diffuse reflection surface, thereby playing the role of anti-glare. Although the traditional anti-glare cover of the display screen can reduce the glare effect, the user ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00C09K13/02
Inventor 卢普飞王越超付建锋
Owner GUANGDONG XIAOTIANCAI TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap