Multiplexed high tcr based ampoule heaters

Abstract

A system for heating components of a substrate processing system includes a controller and a plurality of heaters arranged at a plurality of locations along a path of fluid flow from a source of fluid to a destination in the substrate processing system. The controller is configured to group the plurality of heaters into a plurality of groups of heaters. Each group of heaters comprises at least one of the plurality of heaters. The controller is further configured to determine a temperature gradient to be maintained across the plurality of groups of heaters. The controller is further configured to select a group of heaters from the plurality of groups of heaters and control power supplied to the selected group of heaters to maintain the temperature gradient across the plurality of groups of heaters.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to U.S. Patent Application No. 62 / 735,464, filed September 24, 2018. The entire disclosures of the above-cited applications are hereby incorporated by reference. technical field [0003] The background description provided herein is for the purpose of generally presenting the context of the disclosure. The work of the presently named inventors is neither expressly nor impliedly admitted to be prior art to the present disclosure to the extent that it is described in this Background section and in aspects of the specification that cannot be determined to be prior art at the time of filing. technology. Background technique [0004] The present disclosure relates generally to substrate processing systems, and more particularly to multiplexed high temperature coefficient of resistance (TCR) based ampoule heaters for substrate processing systems. [0005] Substrate processing systems may b...

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Problems solved by technology

Condensation of gas mixtures can cause defects and are often difficult to remove

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