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Ultra-low absorption double-sided anti-reflection film in ultraviolet band and preparation method thereof

A technology of ultraviolet band and anti-reflection coating, which is applied in the direction of optical components, instruments, optics, etc., can solve the problems that the service life and use effect of the lens cannot meet the requirements of customers, and the absorption of the film layer is large.

Active Publication Date: 2022-05-24
NANJING WAVELENGTH OPTO ELECTRONICS SCI & TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing anti-reflection coating in the ultraviolet band has always had the problem of large film absorption, which makes the service life and use effect of the lens fail to meet the customer's requirements

Method used

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  • Ultra-low absorption double-sided anti-reflection film in ultraviolet band and preparation method thereof
  • Ultra-low absorption double-sided anti-reflection film in ultraviolet band and preparation method thereof
  • Ultra-low absorption double-sided anti-reflection film in ultraviolet band and preparation method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] like figure 1 As shown, an ultra-low absorption double-sided anti-reflection coating in the ultraviolet band has a structure of

[0042] Air / LHLHLHLH / Sub / HLHLHLHL / Air, where H stands for SiO 2 Film layer, the thickness is 63mm, L stands for MgF 2 The film layer has a thickness of 60mm, Sub represents the substrate, the thickness of the substrate is 5mm, and the material is fused silica.

[0043] The preparation method of the above-mentioned antireflection film comprises the following steps:

[0044] (1) Substrate heating: Wipe the substrate with a degreased gauze dipped in a 3:1 mixture of absolute ethanol and ether, then clean the substrate by ultrasonic cleaning, and then bake and heat the substrate in a vacuum state to increase the substrate temperature. Among them, the baking temperature is 160 ℃ ~ 170 ℃, and the baking time is 1.5 hours;

[0045](2) Ion beam cleaning: ion beam cleaning is performed on the substrate, the ion cleaning time is 2min, the ion beam v...

Embodiment 2

[0055] like figure 2 As shown, an ultra-low absorption double-sided anti-reflection coating in the ultraviolet band has the structure:

[0056] Air / 1.06L0.63H1.27L0.66H / Sub / 0.66H1.27L0.63H1.06L / Air, the theoretical thickness of each layer is 36.84 / 81.84 / 35.17 / 68.3 / Sub / / 68.3 / 35.17 / 81.84 / 36.84nm, among which , H stands for LaF 3 Film layer, L stands for AlF 3 For the film layer, Sub represents the substrate, the thickness of the substrate is 5mm, and the material is sapphire.

[0057] The preparation method of the above-mentioned antireflection film comprises the following steps:

[0058] (1) Substrate heating: Wipe the substrate with a degreased gauze dipped in a 3:1 mixture of absolute ethanol and ether, then clean the substrate by ultrasonic cleaning, and then bake and heat the substrate in a vacuum state to increase the substrate temperature. Among them, the baking temperature is 160 ℃ ~ 170 ℃, and the baking time is 1.5 hours;

[0059] (2) Ion beam cleaning: ion beam ...

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Abstract

The invention discloses an ultra-low absorption double-sided anti-reflection film in the ultraviolet band and a preparation method thereof. An ultra-low absorption double-sided anti-reflection film in the ultraviolet band has the structure: Air / 1.06L0.63H1.27L0.66H / Sub / 0.66H1.27L0.63H1.06L / Air, where H stands for LaF 3 film layer, L stands for AlF 3 Film layer, Sub stands for substrate. Ultra-low absorption double-sided anti-reflection film in the ultraviolet band of the present invention, film system design and process improvement, coating film system on both sides of the 5mm thick ultraviolet window glass substrate to achieve 355nm ultraviolet anti-reflection film, reducing absorption and improving transmittance , the average transmittance is greater than 99.5%, and the single-sided reflection is less than 0.15%.

Description

technical field [0001] The invention relates to an ultra-low absorption double-sided anti-reflection film in the ultraviolet band and a preparation method thereof, and belongs to the field of anti-reflection films. Background technique [0002] In optical elements, light energy is lost due to the reflection of the surface of the element. In order to reduce the reflection loss on the surface of the element, a transparent dielectric film is often coated on the surface of the optical element. This film is called an anti-reflection film. [0003] The existing anti-reflection coatings in the ultraviolet band have always had the problem of large film absorption, so that the service life and use effects of the lenses cannot meet the requirements of customers. SUMMARY OF THE INVENTION [0004] The invention provides an ultra-low absorption double-sided anti-reflection film in the ultraviolet band and a preparation method thereof. Through film system design and process improvement,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/115
CPCG02B1/115
Inventor 陈莉李全民吴玉堂王国力
Owner NANJING WAVELENGTH OPTO ELECTRONICS SCI & TECH CO LTD