45results about How to "High resistance to laser damage threshold" patented technology

The invention discloses an optical device for laser beam wave-front correction and a laser beam wave-front correction method. The optical device comprises an optical material, temperature controlling units, a radiating device and a temperature controller, wherein the optical material is used for receiving laser beams emitted from a laser gain medium through one end face, and emitting laser beams from another end face or emitting from the end face for receiving laser beams; theeach temperature control unit is used for heating or cooling under the control of the temperature controller; the radiating device is used for dissipating waste heat generated by the temperature control unit(s) when the temperature controller is used for controlling the temperature control unit(s) to cool; and the temperature controller is used for controlling the one or more temperature control units to heat or cool and controlling the heating amount or cooling amount of the one or more temperature control units, so as to control the temperature of laser beams on a path in the optical material and correct the wave-front of laser beams emitted into the optical material.

The invention provides high-damage-threshold fluoride phosphate laser glass as a material for preparing an ultraviolet-transmittance window, and a preparation method of the high-damage-threshold fluoride phosphate laser glass. The preparation method comprises the steps of adopting an alkali metal oxide, an alkaline earth metal oxide, alumina, zinc oxide and phosphoric pentoxide as main raw materials, adding a small amount of rare earth fluoride, molding and preparing glass pressing blanks based on the drip injection method after the treatments of high-temperature melting, clarification and homogenizing, and finally obtaining the high-damage-threshold fluoride phosphate laser glass material through the annealing treatment. The fused quartz material can be replaced by the above glass material for preparing lenses, plane windows, prisms and other optical components applied to high-energy and high-power laser systems. In this way, the laser-induced damage problems of ultraviolet optical components made of the fused quartz material in existing high-energy and high-power laser systems can be solved. The load output capability of a laser is further improved. Therefore, the above material can be used for preparing the ultraviolet-transmittance optical components of high-power lasers for laser-driven inertial confinement fusion experiments.

The invention discloses a photoinduced stable nonlinear sulfur film, and a preparation method thereof, and belongs to an optical film and a nonlinear optical material. The chemical composition of the film is GexAsySzSe(100-x-y-z), wherein x is smaller than or equal to 14 and greater than or equal to 10; y is smaller than or equal to 28 and greater than or equal to 20; z is smaller than or equal to 50 and greater than or equal to 16. A vacuum thermal evaporation method is adopted in preparation of the film; the vacuum degree is 10<-4> to 10<-6> torr; the evaporation rate is 3-20 nm/min; the refractive index of the sulfur film prepared by the method at wavelength of 1.55 microns is 2.20-2.56; the refractive index change of the film under thermal annealing and sub-band gap illumination is 10<-3>; an optical band gap is 1.98-2.48ev; the loss of the film at the wavelength of 1.55 microns is smaller than 0.2 dB/cm; the third-order nonlinear refractive index at the wavelength of 1.55 microns is 2.0-6.0*10<-14> cm<2>/W; no significant two-photon is absorbed; a laser-damaged threshold is greater than 200 GW/cm<2> (5.3 microns, 150fs, 1kHz). The photoinduced stable nonlinear sulfur film has the advantages that 1, the photoinduced refractive index change is tiny, and the optical performance of an apparatus is stable; 2, the anti-laser damage threshold of the film is high, and application of the apparatus in the field of nonlinear optics is facilitated; 3, the composition and the refractive index of the film obtained by vacuum evaporation are consistent with those of adopted block raw materials, and the films produced in different batches are consistent in performance, and easy to control.

The invention discloses a high-performance chalcogenide glass microsphere and a preparation method thereof, wherein the glass microsphere belongs to an optical microsphere and an infrared sensing material. The chemical composition of the glass microsphere is GexAsyS100-x-y, wherein x is greater than or equal to 8 and smaller than or equal to 12, while y is greater than or equal to 20 and smaller than or equal to 32. The glass microsphere is obtained by means of heat treating 'chalcogenide glass/polymer' composite optical fibers, and the composite optical fibers are obtained by means of drawing 'chalcogenide glass/polymer' preform rods on an optical fiber drawing tower. The chalcogenide glass microsphere prepared by the method has a diameter of 8-300 micrometers, an eccentricity degree smaller than or equal to 1%, surface smoothness smaller than or equal to 1nm, a microcavity quality factor Q greater than or equal to 1x10<5> and a laser induced damage threshold greater than or equal to 400GW/cm<2>(5.3micrometers, 150fs and 1kHz). The chalcogenide glass microsphere can be applied to the fields of molecular sensing and infrared optics. The chalcogenide glass microsphere and the preparation method have the following advantages that 1. the photon-induced refractive index change of glass is extremely small and the optical stability is good; 2. the laser induced damage resisting threshold of the glass microsphere is relatively high and the glass microsphere serving as an optical microcavity is capable of transmitting relatively high laser power; 3. the preparation technology is simple, the cost is very low and a large number of high-quality microspheres with uniform size can be prepared at a time.

The invention provides a thin-film type adjustable phase retarder which consists of two thin-film type phase delay plates, two three-dimensional optical adjusting mounts and a precise rotating platform. Two phase delay plates are arranged on the rotating platform and ensure that reflecting surfaces are parallel; a beam of light enters to the first phase delay plate at a certain angle, reflects to the second phase delay plate and emerges parallel to the incident light direction through the second reflection. The rotating platform rotates to change an incidence angle of the beam of light; the phase delay or compensation dosage is also changed along the change of the incident angle, thereby realizing precise and tunable phase delay. The thin-film type adjustable phase retarder is characterized in simple structure, easy manufacturing, high degree of precision, simple operation, multi-purpose, etc.

The invention relates to a reflecting mirror with high reliability for a laser gyro prepared through ion beam sputtering. The reflecting mirror is prepared by the following steps of: alternately plating a regularTiO2/SiO2 film high reflective coating with 1/4 working wavelength on a nano-grade quartz base by adopting a double-ion-beam sputtering and depositing process, plating a layer of extremely thin air interface layer material HfO2 at the outermost layer, and carrying out postprocessing under the condition of 340 DEG C/6h on a reflecting mirror film in the air after the plating is finished. The reflecting mirror provided by the invention has extremely low loss and dispersion, a high laser damage resistant threshold, heat stability within 340 DEG C and favorable plasma discharging environment resisting capacity and can keep stable optical property of over 15000Sec in an environment with the plasma energy of 200w. The reflecting mirror prepared by using the technology provided by the invention has stable working property in a gyro resonator, has high environment reliability and can meet the application requirement of a high-precision laser gyro.

The invention relates to a method for washing an optical substrate before film coating. According to the operating method, diethyl ether and ethyl alcohol are replaced by n-heptane which is used for preparing a mixed washing solution according to a certain proportion, and the mixed washing solution is dripped to optical washing dust-free cloth to wipe and wash optical quartz glass. The dirt removing situation of the substrate is observed through the irradiation of a high-light optical detecting lamp, and accordingly the purpose of cleaning the substrate is achieved. By means of the method for washing the optical substrate before film coating, the adhesive force of an optical thin film can be improved, the anti-laser-damaged threshold value of the thin film can be increased, and the service life of the optical thin film can be prolonged.

The present invention discloses a high-reflectivity high-damage threshold superwide-band fs laser reflector. On some support or pedestal, there is one rectangular prism with one inclined plane and two right angle planes in the angle of 45 deg to the inclined plane, the inclined plane is optical polished plane and the two right angle planes has anti-reflecting film formed via vacuum vaporizing and coating. Owing to the material and structure, the rectangular prism can transmit fs laser of 200 nm over spectral bandwidth with the transmittance being reaching to 99.5%. The present invention has reasonable design, simple structure, high transmittance, less laser absorption, high laser damage threshold and other advantages. The present invention may be used in various fs laser equipment.

The invention discloses a 266-nanometer high-power laser antireflection film and a preparation method thereof, the 266 nanometer high-power laser antireflection film has a film layer structure of A/cL/bH/aL/SUB/aL/bH/cL/A, wherein SUB represents a glass substrate, A represents air, H represents a high-refractive-index film layer, L represents a low-refractive-index film layer, a, b and c are coefficients of the quarter reference wavelength optical thickness of each film layer respectively, a is 1.6 +/-0.2, b is 0.53 +/-0.2, and c is 1.13 +/-0.2. The 266-nanometer high-power laser antireflection film has a high laser damage resistance threshold in the ultraviolet band, the transmittance of the antireflection film at the 266nm band can reach 99.9% or above, and the 266-nanometer high-power laser antireflection film not only has good spectral performance, but also has good mechanical stability and stability, and can meet some high-end applications in the current near-ultraviolet field.

The saturable semiconductor absorption mirror with high surface reflectivity includes one substrate, one buffering layer formed on the substrate, one Bragg reflector made on the buffering layer and with high reflectivity, one quantum well made on the Bragg reflector and acting for light absorption and photocarrier relaxation, one high reflectivity film made on the quantum well with dielectric material and capable of lowering the modulation depth and reducing non-saturation loss.

The invention provides a method for raising the refractive index of a hafnium oxide film. The HfO2 film is manufactured through electron beam evaporation plating, and the method is characterized in that HfO2 film materials of a first evaporation source are evaporated, SiO2 film materials of a second evaporation source are evaporated at the same time, and the proportion of the deposition rate UpsilonH of the HfO2 film materials to the deposition rate UpsilonL of the SiO2 film materials is greater than 4: 1. By means of the method, the refractive index of the film can be raised, and it is avoided that the laser damage resistance threshold value of the film declines due to negative factors such as film absorption and defect density raising. A certain proportion of SiO2 is mixed into the HfO2 film, the band gaps of the film are increased, and thereby the laser damage resistance threshold value of the film can be raised to a certain degree.

The invention discloses a dual wavelength antireflection film for excimer laser and an optical film thickness monitoring system that are applied to an excimer laser device compatible with 193 nm and 248 nm deep ultraviolet. The dual wavelength antireflection film for the excimer laser comprises a substrate and a multilayer film arranged on the substrate, wherein the multilayer film is formed by alternating stacking high refractive index films and low refractive index films, each high refractive index film is made of lanthanum fluoride, each low refractive index film is made of magnesium fluoride, and the multilayer film has 4 to 10 layers. The optical film thickness monitoring system comprises an electron-beam evaporation source, a thermal resistance evaporation source and a plated substrate; a baffle plate is arranged between the electron-beam evaporation source as well as the thermal resistance evaporation source and a plated substrate. The dual wavelength antireflection film applied to deep ultraviolet excimer laser ranges from 193 nm to 248 nm and is very low in residual reflectivity of a substrate surface, and minimum absorbing and scattering loss can be realized.

The invention discloses a laser-irradiation-resistant diffuse reflection metal panel and a manufacturing method thereof. After a metal base plate is subjected to sand blasting so as to become a diffuse surface, a zinc film, a nickel film and a golden film are sequentially coated on the diffuse surface, the laser-resistant damage threshold of the metal panel can be improved effectively, and at the same time, the damage of a component on the optical path caused by mirror reflectors is avoided.

The invention relates to a self-adjusting Q laser crystal and a purpose of the self-adjusting Q laser crystal. A chemical formula of the self-adjusting Q laser crystal is Na3La9-xRExB8O27, wherein x is more than 0 and is less than 9, RE is one or two of Pr3+, Nd3+, Sm3+, Dy3+, Ho3+, Er3+, Tm3+ and Yb3+ rare earth ions; the self-adjusting Q laser crystal belongs to a D3h-62m point group; a linear electro-optical coefficient matrix only includes an electro-optical coefficient gamma 22; and the electro-optical coefficient gamma 22 is equal to 2.3 pm/V. The self-adjusting Q laser crystal has the advantages of no deliquescence, high laser induced damage threshold and the like and can be used for manufacturing a self-adjusting Q laser device with a simple and compact structure.

The invention discloses a saturable absorber based on a planar optical waveguide and a preparation method thereof. The saturable absorber is composed of the planar optical waveguide and a metal oxidefilm covering the planar optical waveguide. The planar optical waveguide comprises a PLC chip and a fiber V-groove. The metal oxide includes ITO, FTO, AZO, IZO, GZO, IGZO and transition metal oxides such as Ti, V, Mo, W, etc. The working band of the saturable absorber can cover the visible near infrared band because of different materials of the saturable absorber. The invention provides the brand-new saturable absorber for various pulse lasers and the preparation method thereof. The saturable absorber has the characteristics of simple preparation method, low cost and high laser damage threshold and can be widely used in various lasers such as solid-state lasers, fiber lasers and semiconductor lasers to generate the shortest laser pulses of being up to 100 femtoseconds.

The invention provides a chromium-nitride-stabilized zirconium oxide vacuum coating material and a manufacturing method thereof. Raw materials of the chromium-nitride-stabilized zirconium oxide vacuum coating material comprise, by mole, 75% to 98% of zirconium oxide and 2% to 25% of chromium nitride, and a proper amount of a polyvinyl alcohol bonding agent is added. The manufacturing method of the chromium-nitride-stabilized zirconium oxide vacuum coating material includes the following steps that firstly, zirconium oxide powder and chromium nitride powder serve as the raw materials, the raw materials are weighed according to the selected mole percents and evenly mixed, the polyvinyl alcohol bonding agent is then added, and the powder is agglomerated, pelletized and formed; secondly, the particle materials are pre-sintered, wherein the pre-sintering temperature is 1200 DEG C; and thirdly, the materials are sintered in a vacuum sintering furnace and then naturally cooled to the indoor temperature. By the adoption of the chromium-nitride-stabilized zirconium oxide vacuum coating material, the problems that a traditional zirconium oxide coating material is unstable and the refraction rate of the traditional zirconium oxide coating material is uneven in the coating process are solved, and the damage threshold value of a zirconium oxide film is increased.

The invention discloses a titanium dioxide nano-porous coating and a preparation method thereof. The coating comprises a TiO2 nanoparticle porous film which is coated on a substrate and has a thickness of 100-700 nm, wherein the particle size of TiO2 nanoparticles is 20-30 nm, and the diameter of pores in the porous film is 8-10 nm. The preparation method comprises the steps: adding a mixed liquiddropwise to an acidic mixed aqueous solution firstly, wherein the mixed liquid and the acidic mixed aqueous solution are prepared separately; and then performing stirring so as to obtain TiO2 sol, then adding polyvinylpyrrolidone to the TiO2 sol, performing stirring so as to obtain mixed sol, then adding ethanol to the mixed sol, performing dilution and aging so as to obtain coating sol, then immersing a substrate in the coating sol for dip coating, then performing airing, then putting the obtained coated substrate at 480-520 DEG C, performing heat preservation, and then performing cooling soas to obtain the desired product. The structure is reasonable, the film layer has no easy cracking, and the titanium dioxide nano-porous coating can be commercialized in super-hydrophilic and infrared absorption fields easily and widely.

A process for preparing the anti-reflecting film with high power to prevent laser damage includes such technological steps as proportionally mixing raw materials, stirring, ageing at 20-60 deg.C for 10-180 days in sealed container to obtain SiO2 sol as filing liquid, and rotational filming to obtain anti-reflecting film. Its advantages include easily available raw materials, low cost, simple preparing process, high transmissive rate up to 100% and high threshold of laser damage.