Preparation of membrane for preventing injury from laser beam

A technology of laser damage and anti-reflection coating, applied in optics, optical components, instruments, etc., can solve the problem of low anti-laser damage threshold of anti-reflection coating, and achieve the effects of low cost, simple preparation and easy availability of raw materials

Inactive Publication Date: 2003-05-21
SHANXI INST OF COAL CHEM CHINESE ACAD OF SCI
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The anti-reflection coating in the prior art...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] 20ml tetraethyl orthosilicate, 3.2ml water, 110ml absolute ethanol, 0.1ml NH 3 ·H 2 O and 0.1ml (200) PEG were mixed and stirred thoroughly, then put into a closed container, and aged at 20°C for 150 days to obtain a SiO2 sol coating solution, which was made into an anti-reflection film by spin coating method, and the optical properties were as follows: Table 1.

Embodiment 2

[0016] The added methyl orthosilicate is 20ml, water is 2.0ml, absolute ethanol is 50ml, NH 3 ·H 2 O is 0.05ml, PEG is 0.5ml (200), and the rest are the same as in Example 1. The optical properties are shown in Table 1.

Embodiment 3

[0018] The added tetraethyl orthosilicate is 20ml, water is 10ml, absolute ethanol is 200ml, NH 3 ·H 2 O is 0.1ml, PEG is 1.0ml (200), and the rest are the same as in Example 1. The optical properties are shown in Table 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A process for preparing the anti-reflecting film with high power to prevent laser damage includes such technological steps as proportionally mixing raw materials, stirring, ageing at 20-60 deg.C for 10-180 days in sealed container to obtain SiO2 sol as filing liquid, and rotational filming to obtain anti-reflecting film. Its advantages include easily available raw materials, low cost, simple preparing process, high transmissive rate up to 100% and high threshold of laser damage.

Description

technical field [0001] The invention belongs to a method for preparing an anti-reflection film, in particular to a method for preparing an anti-reflection film with high resistance to laser damage. Background technique [0002] There are many methods for preparing anti-reflective coatings, including chemical coating and physical coating. Due to its own many insurmountable shortcomings, the physical coating method is subject to many restrictions in practical application, so the chemical coating method has been greatly developed in recent years. I.M.Thomas (Appl.optics, 1986, 25:1481) used colloidal SiO 2 The anti-reflection film is prepared, and the optical transmittance can reach 100%, but no specific threshold data is given. In 1992, I.M.Thomas (Appl.optics, 1992, 31: 6145) improved the preparation of the above-mentioned colloids, and while still maintaining the anti-reflection properties, the laser damage threshold was improved (50J / cm 2 / 1064mn / 10ns). Shanghai Institu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B1/111
Inventor 孙予罕吴东孙继红范文浩徐耀
Owner SHANXI INST OF COAL CHEM CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap