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Anti-reflection and anti-laser-damage glass and preparation method thereof

An anti-laser and anti-reflection technology, applied in the field of glass, can solve problems such as damage to optical components, and achieve the effects of low refractive index, high hardness, and stable chemical properties

Pending Publication Date: 2019-06-07
FUJIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Under the action of strong laser light, optical components may be damaged in a short time

Method used

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  • Anti-reflection and anti-laser-damage glass and preparation method thereof

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Comparison scheme
Effect test

Embodiment 1

[0026] Embodiment 1: The preparation method of anti-reflection and anti-laser damage glass of the present invention comprises the following steps:

[0027] 1) Surface treatment of the substrate: the substrate was ultrasonically cleaned in deionized water and ethanol for 30 minutes respectively, and then dried with nitrogen;

[0028] 2) Prepare the inner layer: send the substrate into the coating chamber, and use radio frequency magnetron sputtering to form SiO 2 layer, the temperature of the substrate is 25°C, the negative bias voltage is 50V, the working pressure is 0.2Pa, the substrate speed is 2rpm, the silicon target current is 2A, O 2 The flow rate is 2sccm, the argon flow rate is 5sccm, the sputtering time is 10min, the RF power is 100W, and the distance between the silicon target and the substrate is 30mm;

[0029] 3) Preparation of the first layer of the middle layer: continue RF magnetron sputtering to form SiO 2 +ZrO 2 layer, where SiO 2 with ZrO 2 The mass rati...

Embodiment 2

[0032] Embodiment 2: The preparation method of anti-reflection and anti-laser damage glass of the present invention comprises the following steps:

[0033] 1) Perform surface treatment on the substrate: ultrasonically clean the substrate in deionized water and ethanol for 30 minutes respectively, and then blow dry with nitrogen;

[0034] 2) Prepare the inner layer: send the substrate into the coating chamber, and use radio frequency magnetron sputtering to form SiO2 layer, the temperature of the substrate is 60°C, the negative bias voltage is 150V, the working pressure is 1Pa, the substrate speed is 8rpm, the silicon target current is 4A, O 2 The flow rate is 6sccm, the argon gas flow rate is 25sccm, the sputtering time is 30min, the RF power is 200W, and the distance between the silicon target and the substrate is 60mm;

[0035] 3) Preparation of the first layer of the middle layer: continue RF magnetron sputtering to form SiO 2 +ZrO 2 layer, where SiO 2 with ZrO 2 The ma...

Embodiment 3

[0038] Embodiment 3: The preparation method of anti-reflection and anti-laser damage glass of the present invention comprises the following steps:

[0039] 1) Perform surface treatment on the substrate: ultrasonically clean the substrate in deionized water and ethanol for 30 minutes respectively, and then blow dry with nitrogen;

[0040] 2) Prepare the inner layer: send the substrate into the coating chamber, and use radio frequency magnetron sputtering to form SiO 2 layer, the temperature of the substrate is 45°C, the negative bias voltage is 100V, the working pressure is 0.6Pa, the substrate speed is 5rpm, the silicon target current is 3A, O 2 The flow rate is 4sccm, the argon flow rate is 15sccm, the sputtering time is 20min, the RF power is 150W, and the distance between the silicon target and the substrate is 45mm;

[0041] 3) Preparation of the first layer of the middle layer: continue RF magnetron sputtering to form SiO 2 +ZrO 2 layer, where SiO 2 with ZrO 2 The ma...

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Abstract

The invention discloses anti-reflection and anti-laser-damage glass and a preparation method thereof. The glass comprises a substrate. A composite film layer is arranged on the surface of the substrate and sequentially comprises an inner layer, a middle layer and an outer layer from inside to outside, wherein the inner layer is a SiO2 layer, the middle layer is a (SiO2+ZrO2) layer, and the outer layer is a ZrO2 layer. The antireflection and anti-laser-damage effects of the glass can be effectively improved.

Description

technical field [0001] The invention relates to the field of glass, in particular to an anti-reflection and anti-laser damage glass and a preparation method thereof. Background technique [0002] Thin film damage restricts the development of laser systems in the direction of high life and high power; the damage of thin film is mainly caused by the increase of stress and temperature rise caused by absorption. Since optical thin film materials may contain various impurities and defects during the preparation process, these Impurities and defects have considerable absorption coefficients. When impurities and defects absorb laser irradiation energy, the temperature rises suddenly, melting or gasifying the impurity particles, and generating a large local thermal stress in the optical material around the impurities. When the When the stress exceeds the tensile strength of the optical material, crack damage occurs in the optical film, and the vapor pressure generated by the vaporiz...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/34
Inventor 简明德练国富简慈萱邱松茂
Owner FUJIAN UNIV OF TECH
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