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266-nanometer high-power laser antireflection film and preparation method thereof

A high-power, anti-reflection coating technology, used in optics, optical components, instruments, etc., can solve the problems of short life, low transmittance, and low light damage threshold

Pending Publication Date: 2021-05-11
NANJING WAVELENGTH OPTO ELECTRONICS SCI & TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The anti-reflection coatings of UV laser products currently on the market have problems such as low transmittance, low damage threshold against light, poor use effect, and short life.

Method used

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  • 266-nanometer high-power laser antireflection film and preparation method thereof
  • 266-nanometer high-power laser antireflection film and preparation method thereof
  • 266-nanometer high-power laser antireflection film and preparation method thereof

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Embodiment 1

[0028] Such as figure 1 As shown, the 266nm high-power laser anti-reflection coating, the film layer structure is: A / cL / bH / aL / SUB / aL / bH / cL / A, where SUB stands for fused silica substrate; A stands for air; H stands for AL 2 o 3 film layer; L stands for MgF 2 film layer; a﹑b﹑c are the coefficients of the quarter reference wavelength optical thickness of each film layer, a is 1.6, b is 0.53, c is 1.13, and the physical thickness of each film layer is A / 52.36nm / 20nm / 75.44nm / SUB / 75.44nm / 20nm / 52.36nm / A.

[0029] The preparation of the above-mentioned 266 nanometer high-power laser anti-reflection coating comprises the following steps:

[0030] (1) Evaporation environment maintenance: add an isolation baffle between the evaporation source and the glass substrate to block and absorb ineffective evaporation materials, reduce pollution near the glass substrate, and reduce the probability of film defect formation;

[0031] (2) Ultrasonic cleaning: remove the microscopic particles at...

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Abstract

The invention discloses a 266-nanometer high-power laser antireflection film and a preparation method thereof, the 266 nanometer high-power laser antireflection film has a film layer structure of A / cL / bH / aL / SUB / aL / bH / cL / A, wherein SUB represents a glass substrate, A represents air, H represents a high-refractive-index film layer, L represents a low-refractive-index film layer, a, b and c are coefficients of the quarter reference wavelength optical thickness of each film layer respectively, a is 1.6 + / -0.2, b is 0.53 + / -0.2, and c is 1.13 + / -0.2. The 266-nanometer high-power laser antireflection film has a high laser damage resistance threshold in the ultraviolet band, the transmittance of the antireflection film at the 266nm band can reach 99.9% or above, and the 266-nanometer high-power laser antireflection film not only has good spectral performance, but also has good mechanical stability and stability, and can meet some high-end applications in the current near-ultraviolet field.

Description

technical field [0001] The invention relates to a 266nm high-power laser anti-reflection coating and a preparation method thereof, belonging to the technical field of anti-reflection coatings. Background technique [0002] Ultraviolet laser is widely used in material processing, photolithography, medical treatment, scientific research and other fields due to its advantages of short wavelength, high molecular energy and small diffraction effect. [0003] In optical components, the light energy is lost due to the reflection on the surface of the component. In order to reduce the reflection loss on the surface of the component, a transparent dielectric film is often coated on the surface of the optical component. This film is called an anti-reflection coating. [0004] The anti-reflection coatings of ultraviolet laser products currently on the market have problems such as low transmittance, low damage threshold against light, poor use effect, and short life. Contents of the i...

Claims

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Application Information

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IPC IPC(8): G02B1/115
CPCG02B1/115
Inventor 王泽栋李全民李林峰王国力
Owner NANJING WAVELENGTH OPTO ELECTRONICS SCI & TECH CO LTD
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