Method for washing optical substrate before film coating

An optical substrate and optical technology, which is applied in the field of optical cleaning, can solve the problems of insufficient cleaning technology research, affecting the adhesion between the optical performance film layer and the substrate, etc., to enhance the anti-laser damage threshold, increase the adhesion, and improve the optical quality. performance effect

Inactive Publication Date: 2014-04-16
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

Judging from the current usage situation, there is still a large gap between the damage threshold value of the laser thin film provided in China and the international level, and one of the reasons for this gap is that the research on the cleaning technology of the front surface of the substrate coating is not de

Method used

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Experimental program
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Embodiment Construction

[0010] 1. The experimental piece is divided into two samples, sample 1 and sample 2, both of which are made of optical quartz glass JGS3 with a diameter of 100mm. The surface roughness of sample 1 is measured by zygo profiler as 0.567nm, and that of sample 2 is 0.565nm.

[0011] 2. Sample 1 adopts the mixed organic solvent made of n-heptane and ethanol according to the volume ratio of 4:1 according to the method of the present invention, and wipes it with an optical dust-free cloth under the irradiation of a high-brightness optical detection lamp (BRAUN NOVAMAT E130) After cleaning, after five minutes, the cleanliness requirements of the substrate are obtained (less than 1 pitting particle per three square centimeters, and the naked eye looks basically free of oil, dust, etc.); sample 2 is made of traditional ether and ethanol at a volume ratio of 1:1 Mixed organic solvents were wiped and cleaned by the same method, and the same standard cleaning requirements were obtained afte...

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Abstract

The invention relates to a method for washing an optical substrate before film coating. According to the operating method, diethyl ether and ethyl alcohol are replaced by n-heptane which is used for preparing a mixed washing solution according to a certain proportion, and the mixed washing solution is dripped to optical washing dust-free cloth to wipe and wash optical quartz glass. The dirt removing situation of the substrate is observed through the irradiation of a high-light optical detecting lamp, and accordingly the purpose of cleaning the substrate is achieved. By means of the method for washing the optical substrate before film coating, the adhesive force of an optical thin film can be improved, the anti-laser-damaged threshold value of the thin film can be increased, and the service life of the optical thin film can be prolonged.

Description

technical field [0001] The invention relates to the field of optical cleaning, in particular to a cleaning method for a quartz glass substrate before coating. Background technique [0002] Laser thin film deposition is an important link in the preparation of optical components in laser systems, and its quality and performance are important factors that affect and ensure the performance of the entire system. With the development of high-energy and high-power laser systems, the acquisition and maintenance of clean surfaces of optical components has become more and more important. Laser inertial confinement sudden change devices, such as the Nova device in the United States, the National Ignition Facility (NIF) in the United States, and the Shenguang series devices in China, all contain a large number of laser devices and optical components. These high-power laser systems place higher demands on laser thin films, especially an increase in the damage threshold. Exploring how t...

Claims

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Application Information

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IPC IPC(8): B08B3/08
CPCB08B3/08
Inventor 龚选香李刚孙龙
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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