848results about How to "Reduce the possibility of damage" patented technology

A SWP source includes an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma. A cover plate coupled to the plasma surface of the EM wave launcher protects the EM wave launcher from the plasma.

A single-piece top surface display and integrated front cover for an electronic device. In one embodiment, the cover comprises a thin, flexible, transparent layer coupled with a supporting structure. The flexible layer is supported above a display screen which is coupled with pressure activated sensors located under the display screen. The cover is dust-free, waterproof, and has a flat outer surface that is free of any steps or indentations. Users input data by applying pressure on the cover which causes the display screen to deflect and activate the sensors. The pressure exerted on the sensors is triangulated to register the position of the user input. In another embodiment, the cover is transparent, rigid, and directly contacts the pressure activated sensors which are located in front of the display screen or in the housing behind it. When pressure is applied to the cover, the cover deflects and activates the sensors. In both embodiments, an accelerometer identifies valid input events.

A wireless power adapter that mounts to the docking station port of a portable computer, such as a laptop computer, notebook computer or tablet computer. The wireless power adapter includes a docking port electrical connector selected to interface with the pre-existing docking port electrical connector on the portable computer. The adapter docking port electrical connector includes power pins to connect with the pre-existing power pins of the portable computer docking port electrical connector. The wireless power adapter may include an inductive secondary to wirelessly receive power from an inductive primary. The wireless power adapter may include a mechanical connector that interfaces with the pre-existing docking station mechanical connector on the portable computer. The present invention may also include a remote inductive power supply having a base adapted to support the laptop and adapter combination. The base may includes inductive power supply circuitry and an inductive primary to produce an inductive field to wirelessly provide power to the adapter and ultimately the portable computer. The remote inductive power supply may alternatively be embedded within a work surface, such as a desktop.

A firearm holding device for holding a firearm having a forend, a grip and a buttstock. The holding device comprises a base having a longitudinal axis, a forend support mounted on the base for supporting the forend of the firearm, a grip support mounted on the base for supporting the grip of the firearm, and a buttstock support mounted on the base for supporting the buttstock of the firearm. At least one of the forend support, grip support and buttstock support are moveable on the base along the longitudinal axis of the base to accommodate various sizes and types of firearms.

A plasma processing system for treating a substrate includes a processing chamber including a first chamber portion configured to receive a first gas for providing a plasma space, and a second chamber portion configured to receive a second gas for providing a process space having process chemistry to treat the substrate. A substrate holder is coupled to the second chamber portion of the processing chamber, and configured to support the substrate proximate the process space, and a plasma source is coupled to the first chamber portion of the processing chamber, and configured to form a plasma in the plasma space. A grid is located between the plasma space and the process space, and configured to permit the diffusion of the plasma between the plasma space and the process space in order to form the process chemistry from the process gas.