Display substrate, manufacturing method thereof and display device
A technology for a display substrate and a manufacturing method, which is used in the manufacture of semiconductor/solid-state devices, electrical components, and electrical solid-state devices, etc., can solve problems such as long alignment time, inability to guarantee the position and size accuracy of functional graphics, and achieve guaranteed accuracy. , the overall time shortening, the effect of shortening the exposure time
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[0047] In order to further illustrate the display substrate and the production method thereof, the display device thereof, and the following description will be described in detail below.
[0048] Such as figure 1 As shown, when the functional pattern 80 is produced in the related art, it can be formed by a composition process, and specifically comprises: deposition of a functional layer on the substrate; a photoresist layer is formed on one side of the substrate to the substrate. The photoresist layer performs a primary exposure process and a developing process to form a photoresist pattern, and then the functional layer is etched to form a functional pattern with the photoresist pattern as a mask.
[0049] When the photoresist layer is exposed, the photoresist layer needs to be accurately paired with the mask plate, thereby ensuring the accuracy of the formed photoresist pattern and functional graphics.
[0050] The longer the session time required for the bit, and even if the o...
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