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A single crystal furnace thermal field heating device and heating method thereof

A technology for heating devices and single crystal furnaces, applied in the direction of single crystal growth, single crystal growth, chemical instruments and methods, etc., can solve the problems of inconvenient operation, low accuracy, low efficiency, etc., and achieve avoidance of spillage, convenient operation, and improved efficiency effect

Active Publication Date: 2022-02-18
浙江晶阳机电股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The single crystal furnace is cumbersome to operate during use. The quartz cover is composed of multiple parts. When placing it in the heating element, the traditional operation method needs to disassemble each part and put it from above the heating element. The operation is cumbersome and inconvenient; After the quartz cover is placed, it is necessary to adjust the level of the quartz cover and the coaxiality of the quartz cover and the seed rod. In the prior art, it is usually adjusted by placing a gasket under the reference piece, which is inconvenient to operate and has a high accuracy. It is relatively low, and it needs more calibrations to meet the requirements. The efficiency is low, and the labor intensity of the staff is high; after calibration, sand needs to be filled in the quartz cover. The traditional method of adding a spoon is inefficient, and the sand is easy to spilled

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  • A single crystal furnace thermal field heating device and heating method thereof
  • A single crystal furnace thermal field heating device and heating method thereof
  • A single crystal furnace thermal field heating device and heating method thereof

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Embodiment Construction

[0061] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0062] A single crystal furnace thermal field heating device, the heating device is located in the single crystal furnace 1, such as figure 1 , figure 2 , Figure 4 , Figure 5 As shown, the single crystal furnace 1 is provided with a support frame 4, the support frame 4 is provided with a base 6 and an adjustment member 5, the adjustment member 5 controls the base 6 to move up and down on the support frame 4, and the base 6 is provided with a reference plate 7,...

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Abstract

The invention discloses a single crystal furnace thermal field heating device and a heating method thereof. The heating device is located in the single crystal furnace, and the single crystal furnace is provided with a support frame. The support frame is provided with a base and an adjusting member, and the adjusting member controls the base. It is located on the support frame and moves up and down. The base is equipped with a reference plate, and the base is provided with an array of adjustment screws. The adjustment screw is used to adjust the level of the reference plate. Filler, the filler is used to fill sand around the quartz cover and crucible. The heating device of the present invention moves the base downward by turning the second rotating handle, so that a gap is formed between the reference plate and the heating element to place the quartz cover on the reference plate, replacing the traditional method of dispersing the quartz cover into multiple parts from above the heating element. Putting it in, it is easy to operate and is conducive to improving efficiency; by turning the adjustment screw, the level of the reference plate is changed, replacing the traditional gasket adjustment, which is convenient and quick.

Description

technical field [0001] The invention relates to the field of single crystal furnaces, in particular to a single crystal furnace thermal field heating device and a heating method thereof. Background technique [0002] The single crystal furnace is a kind of equipment that melts polycrystalline materials such as polycrystalline silicon with a graphite heater in an inert gas (mainly nitrogen and helium) environment, and grows a single crystal without dislocation by the Czochralski method. [0003] The single crystal furnace is cumbersome to operate during use. The quartz cover is composed of multiple parts. When placing it in the heating element, the traditional operation method needs to disassemble each part and put it from above the heating element, which is cumbersome and inconvenient to operate; After the quartz cover is placed, it is necessary to adjust the levelness of the quartz cover and the coaxiality of the quartz cover and the seed rod. In the prior art, a gasket is ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B15/14C30B29/06
CPCC30B15/14C30B29/06
Inventor 程旭兵周波
Owner 浙江晶阳机电股份有限公司