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Mask plate and use method of mask plate

A mask and exposure area technology, applied in the field of masks, can solve the problems of low utilization efficiency of masks, high R&D and production costs, and a large number of masks used, so as to reduce R&D and production costs, improve utilization efficiency, reduce Effect of using quantity

Inactive Publication Date: 2021-07-30
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

By designing the exposure areas corresponding to different functional film layers on the same mask, the patterning of different functional film layers can be completed using the same mask, which can solve the problems of low utilization efficiency of existing masks, large number of masks used, and research and development problems. and high production costs

Method used

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  • Mask plate and use method of mask plate
  • Mask plate and use method of mask plate
  • Mask plate and use method of mask plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] see figure 1 , figure 1 A top view of the mask 10 provided in this embodiment of the application, the mask 10 includes a first exposure area 100 and a second exposure area 200, the second exposure area 200 is located on any side of the first exposure area 100; the first exposure area 100 is set There is a first preset pattern for forming the first functional film layer, and the second exposure area 200 is provided with a second preset pattern for forming the second functional film layer, wherein the first exposure area 100 and the second exposure area 200 are in the same position. Work at different times.

[0040] In some embodiments, see figure 2 , the first exposure area 100 is used before the second exposure area 200 , and the first functional film layer 31 and the second functional film layer 32 are located in different film layers.

[0041] Specifically, as figure 2 As shown, after the first functional film layer 31 is formed on the substrate 30 by the first ...

Embodiment 2

[0050] see Figure 4 , 5 , Figure 4 , 5 The top views of the other two mask sheets 10 provided in the embodiments of the present application are respectively, the mask sheet 10 further includes a third exposure area 300, and the first exposure area 100, the second exposure area 200 and the third exposure area 300 are all in different time periods use.

[0051] Specifically, the first exposure area 100 is provided with a first preset pattern for forming the first functional film layer, the second exposure area 200 is provided with a second preset pattern for forming the second functional film layer, and the third exposure area 300 A third preset pattern for forming the third functional film layer is provided, wherein the first exposure area 100 , the second exposure area 200 and the third exposure area 300 are all used in different time periods.

[0052] In some embodiments, see Figure 4 , the first exposure area 100 , the second exposure area 200 and the third exposure ...

Embodiment 3

[0061] see Image 6 , the embodiment of the present application also provides a method for using any of the above-mentioned masks, and the method for using the mask includes the following steps:

[0062] Step S100 : providing a substrate, forming a first film layer on the substrate, forming a first photoresist on the first film layer, exposing the first photoresist using the first preset pattern of the first exposure area, and then performing The developing and etching processes form the first functional film layer, and the second exposure area is in a shielded state at this time;

[0063] Step S200 : forming a second film layer on the first functional film layer, forming a second photoresist on the second film layer, exposing the second photoresist using the second preset pattern of the second exposure area, and then performing The developing and etching processes form the second functional film layer, and the first exposure area is in a shielding state at this time.

[006...

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Abstract

The embodiment of the invention discloses a mask plate and a use method of the mask plate. The mask plate comprises a first exposure area and a second exposure area, and the second exposure area is positioned on any side of the first exposure area; the first exposure area is provided with a first preset pattern used for forming a first functional film layer, the second exposure area is provided with a second preset pattern used for forming a second functional film layer, and the first exposure area and the second exposure area work in different time periods. By designing the exposure areas corresponding to the film layers with different functions on the same mask plate, patterning manufacturing of the film layers with different functions can be completed by adopting the same mask plate, and the problems that an existing mask plate is low in utilization efficiency, large in use number and high in research and development and production cost can be solved.

Description

technical field [0001] The present application relates to the field of display, and in particular, to a mask and a method for using the mask. Background technique [0002] In the current flat panel display industry, a mask exposure method is usually used to obtain a specially designed pattern when fabricating an array substrate (TFT substrate) and a color filter substrate (CF substrate). Generally speaking, each process needs to make a specific mask, and the mask is relatively expensive. When the array substrate (TFT substrate) and the color filter substrate (CF substrate) have a large number of film layers or process steps, the high cost of the mask plate will undoubtedly greatly increase the R&D and production costs. Therefore, the utilization efficiency of the existing mask plates is low, the number of masks used is large, and the research and development and production costs are high. SUMMARY OF THE INVENTION [0003] Embodiments of the present application provide a ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00
CPCG03F1/00
Inventor 莫超德张博
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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