Photomask with protection structure and preparation method thereof

Abstract

The invention provides a photomask with a protection structure and a preparation method thereof, and the preparation method comprises the steps: providing a first light-transmitting substrate, and etching a recessed pattern groove in the surface of the first light-transmitting substrate; forming a pattern mask layer in the pattern groove of the first light-transmitting substrate; providing a second light-transmitting substrate; the first light-transmitting substrate and the second light-transmitting substrate are bonded, and the pattern groove and the second light-transmitting substrate are matched to form a sealing cavity so as to seal the pattern mask layer. According to the invention, the problem of photomask atomization can be effectively controlled, the pattern mask layer can be always kept clean, and the pattern mask layer is always isolated from the external environment, so that the atomization problem can be controlled, regular cleaning is not needed, and the equipment cost and the process cost are greatly saved.

Description

technical field [0001] The invention belongs to the field of semiconductor manufacturing, in particular to a photomask with a protective structure and a preparation method thereof. Background technique [0002] With the continuous improvement of integrated circuit manufacturing methods and the continuous reduction of line width in lithography technology, the area of ​​semiconductor devices is becoming smaller and smaller. The layout of semiconductors has evolved from ordinary single-function separation devices to integrated high-density multi-functional From the initial IC (integrated circuit) to LSI (large-scale integrated circuit), VLSI (very large-scale integrated circuit), until today's ULSI (ultra-large-scale integrated circuit), the area of ​​the device is further reduced. Considering the complexity of process research and development, long-term and high cost and other unfavorable factors, how to further increase the integration density of devices on the basis of the c...

AI Technical Summary

Problems solved by technology

[0006] For this reason, the object of the present invention is to provide a kind of photomask with protective structure and preparation method thereof, be used to solve the problem that the protective film of photomask in the prior art is easy to fog on the photomask surface during use question

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