Metal shade

A technology of metal masking and graphics area, applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve problems such as uneven stress, achieve the effect of reducing length difference and avoiding warping

Active Publication Date: 2022-06-21
浙江众凌科技有限公司
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the grooves in this solution are through holes, which lead to unnecessary pixels on the substrate during evaporation. Another problem is that the grooves are arranged at intervals, and the stress in the auxiliary area between the grooves is not uniform.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Metal shade
  • Metal shade
  • Metal shade

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] At the same time, the upper and lower surfaces are dislocated with concave grooves 21, which can avoid warping caused by stress release when the concave grooves 21 are set on one side, and through the structural design of staggered up and down, effectively avoid the situation of upper and lower perforations, and achieve simultaneous stress release on the upper and lower surfaces , and under the same area, the stress relief of the side pattern area 2 is nearly consistent with that of the main pattern area 1 .

[0036] like Figure 4-Figure 6 As shown, the main pattern area 1 is provided with an upper etching hole 11 and a lower etching hole 12, and the surface size of the lower etching hole 12 is larger than that of the upper etching hole 11, and the size of the lower etching hole 12 is generally 1.2 to 2.2 times that of the upper etching hole 11 size, the size and unit area of ​​the first concave groove 211 located on the upper surface of the edge pattern area 2 are the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a metal mask. The metal mask comprises a main pattern area; the edge pattern area is located on the side edge of the main pattern area, the upper surface and the lower surface of the edge pattern area are each provided with a plurality of concave grooves used for reducing the length difference caused by stress release in the calendaring process, and the length difference caused by stress release in the calendaring process is reduced through the concave grooves in the upper surface and the lower surface of the edge pattern area; and unevenness of wave fluctuation at the edge part of the metal shade is prevented.

Description

technical field [0001] The invention relates to the technical field of display screen evaporation, in particular to a metal mask. Background technique [0002] Fine metal mask (FMM, fine metal mask) is mainly used in the OLED evaporation process. The evaporation materials of RGB three colors pass through the holes on the fine metal mask to accurately define the position, shape and size on the glass substrate. The metal sheet carrying the precision metal mask is formed through a cold rolling process, such as figure 1 As shown, the metal sheet is rolled from a thick material into a thin material by upper and lower rollers, forming tensile stress (F1, F3) on the upper and lower surface layers of the metal material, and compressive stress (F2) on the middle layer. In the steady state without etching holes In the case of , F2=F1+F3. [0003] When the thin metal plate is processed into a precision metal mask, the pattern area of ​​the precision metal mask will shrink after etchi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24
Inventor 徐华伟沈洵闫西安曾羽常凯伦
Owner 浙江众凌科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products