Processing apparatus for plasma
A technology of plasma and processing equipment, which is applied in the field of plasma processing equipment and can solve problems such as lack of any guiding measures
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
no. 1 example
[0032] see now Figure 1-Figure 3 , the plasma processing equipment of the first embodiment includes: a chamber cover 1 as a main component, a processing chamber body 2, a waveguide 3, an entrance waveguide 3a, a first dielectric 4, a second dielectric 5, a support 6, a slot antenna plate 7 and a substrate holder 8.
[0033] It should be noted that, figure 1 with figure 2 Each cross-section shown in the image 3 The lines I-I and II-II in correspond to each other.
[0034] The chamber cover 1 is placed opposite the chamber body 2, and they are sealed with a gasket 10. The chamber cover 1 has a slit-shaped opening 1a, the first dielectric 4 is inserted into the slit-shaped opening, and is made of such as SiO 2 、Al 2 o 3 and AIN-like dielectrics, and have a "T"-shaped cross-section shown with bold longitudinal lines. The chamber cover 1 and the first dielectric 4 are also sealed by a gasket 11 which together with the gasket 10 seals off the interior 13 of the chamber. ...
no. 2 example
[0062] According to said first embodiment, microwaves are transmitted through a double dielectric structure consisting of said first and second dielectrics. According to a second embodiment, a Image 6 The plasma processing device shown is constructed without the second dielectric, but with a first dielectric 4 extending in the direction of the shorter side (the direction in which the waveguide extends). Then, a slot antenna plate 7 is in contact with the first dielectric 4 . A support 6 supports only the slot antenna plate 7 .
[0063] The structures of the components other than those described above are almost the same as those of the first embodiment. Components corresponding to each other are shown by the same numerals, so details will not be repeated.
[0064] The slots 7a of the slot antenna board 7 are designed according to the second embodiment as described below.
[0065] A model including a microwave inlet, waveguide 3, an inlet waveguide 3a and a first dielectri...
no. 3 example
[0069] see now Figure 7 with Figure 8 , The plasma processing apparatus according to the third embodiment is constructed to have gas grooves 7b and 7c provided in a slot antenna plate 7. The slot antenna board 7 is not supported by the supports used in the first and second embodiments, but is fixed directly to a chamber cover 1, for example by means of screws.
[0070] It should be noted that, Figure 7 is one with Figure 8 Schematic cross-sectional view corresponding to midline VII-VII.
[0071] The structures of the components other than those described above are almost the same as those of the second embodiment. Components corresponding to each other have adopted the same number, so no more details are given.
[0072] According to said third embodiment, the slot antenna plate 7 has some gas grooves. Thus, it does not require some gas channels in said support as in said first and second embodiments. If the support has the gas grooves, no gas grooves may be provided...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More