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Treatment-room device and atmosphere substitution method, and photoelectric device comprising said device

A technology of electro-optical devices and processing chambers, which is applied in the field of electro-optical devices and organic EL devices, and can solve the problems of residual inert gas, great impact on the production cycle of semiconductor manufacturing, and time-consuming problems

Inactive Publication Date: 2003-08-27
TOKYO ELECTRON LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In this way, in the processing chamber device of the prior art, since the inert gas is replaced by vacuum suction, it not only takes time, but also tends to cause the problem of inert gas residue.
In particular, in a large-volume processing chamber device, the time it takes to replace the atmosphere has a great influence on the tact of semiconductor manufacturing.

Method used

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  • Treatment-room device and atmosphere substitution method, and photoelectric device comprising said device
  • Treatment-room device and atmosphere substitution method, and photoelectric device comprising said device
  • Treatment-room device and atmosphere substitution method, and photoelectric device comprising said device

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[0072] specific implementation plan

[0073] Embodiments of the present invention are described below with reference to the drawings.

[0074] The inkjet head (functional droplet ejection head) of an inkjet printer can accurately eject tiny ink droplets (droplets) into dots, for example, by using special ink, luminescent Or photosensitive resin, etc., can be expected to be applied to the field of manufacturing various parts.

[0075] The electro-optical device of this embodiment is suitable, for example, in a so-called flat-panel display manufacturing device such as an organic EL device. In an inert gas atmosphere, functional liquids such as luminescent materials are ejected from a plurality of functional liquid droplet ejection heads (inkjet). method), forming the EL light-emitting layer and hole injection layer of each pixel that serve as the light-emitting function of the organic EL device.

[0076] Therefore, in this embodiment, an electro-optical device suitable for use...

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Abstract

The objective of this invention is to provide an atmospheric substitution method for chamber device, chamber device, electro-optic device and organic EL device having same, that can substitute inert gas in a chamber room with atmospheric air efficiently within a short period of time. The solution of the present invention is that in the method of substituting inert gas inside a chamber room 11 with atmospheric air of an chamber device 3 according to this invention, an exhaust passage 102 of the chamber room 11 is opened while shutting a gas supply passage 138 of the inert gas. External air is forced into the chamber room 11, to realize substitution of the inert gas inside the chamber room 11 with the atmospheric air.

Description

technical field [0001] The present invention relates to a processing chamber device that accommodates and maintains a workpiece processing device that needs to process workpieces such as substrates in an inert gas environment, an atmosphere replacement method for the processing chamber device, and includes the processing chamber device Electro-optical devices and organic EL devices. Background technique [0002] In the prior art, in the processing chamber device used in semiconductor manufacturing equipment, etc., which process workpieces in an inert gas environment, in the management of workpiece entry and exit, considering safety issues (such as the lack of oxygen of the operator), it is necessary to The inert gas environment in the processing chamber is replaced with the atmosphere. The replacement of the inert gas in the processing chamber with the atmosphere is usually performed by vacuum suctioning the inert gas in the processing chamber. [0003] In this way, in the...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J4/00H01L21/02H01L51/40H01L51/50H05B33/10
CPCH05B33/10H01L51/0004H10K71/13
Inventor 林高之
Owner TOKYO ELECTRON LTD