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Master mask, exposure monitor method, exposure method and semiconductordevice mfg method

一种制造方法、半导体的技术，应用在半导体/固态器件制造、照相制版工艺曝光装置、微光刻曝光设备等方向，能够解决不能预测曝光量影响等问题

Inactive Publication Date: 2004-06-09
KK TOSHIBA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the exposure monitoring method that has been used in the past, although the effective exposure in each exposure process of the multiple exposure method can be predicted, there is also a problem that the exposure to each of the multiple exposures cannot be predicted. problem of influence

Method used

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  • Master mask, exposure monitor method, exposure method and semiconductordevice mfg method
  • Master mask, exposure monitor method, exposure method and semiconductordevice mfg method
  • Master mask, exposure monitor method, exposure method and semiconductordevice mfg method

Examples

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Embodiment Construction

[0092] Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description of the drawings, the same or similar reference numerals are given to those same or similar parts. However, it should be noted that the drawings are schematic, and the relationship between the thickness and the planar size, the ratio of the thickness of each layer, and the like are also different from the actual relationship and ratio. Therefore, the specific thickness or size should be judged with reference to the following description. In addition, it is a matter of course that the relationship or the ratio of the mutual dimensions also includes a portion that differs between the drawings.

[0093] The original plate 4 for double exposure related to the embodiment of the present invention is as figure 1 As shown, by the first mask portion 14a having the first circuit pattern area 21 configured with the circuit pattern to be exposed in the f...

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PUM

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Abstract

A reticle includes a first mask portion including a first opaque portion, first and second exposure monitor patterns provided within first and second window portions in the first opaque portion, increasing transmittances in a first direction and a direction reverse to the first direction, respectively; and a second mask potion including a second opaque portion, third and fourth exposure monitor patterns provided within third and fourth window portions in the second opaque portion in positions corresponding to the first opaque portion upon alignment with the first mask portion, increasing transmittances in the first direction and the reverse direction, respectively.

Description

technical field [0001] The invention relates to a master plate for monitoring effective exposure in a multiple exposure process, and an exposure monitoring method. In addition, it also relates to an exposure method using the exposure monitoring method and a manufacturing method of a semiconductor device. Background technique [0002] In recent years, the multiple exposure method, which requires multiple exposure processes, has attracted attention as one of the microfabrication techniques. The performance of a semiconductor device is largely determined by the size of a wiring pattern. Therefore, in the process using the multiple exposure method, it is required to control the control parameters for the purpose of improving the dimensional accuracy with higher precision. In the case of using the multiple exposure method, usually, the exposure conditions are first obtained for each exposure process, and then each exposure process is performed under the obtained exposure condit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/38G03F1/44G03F1/70G03F7/20H01L21/027
CPCG03F7/70625G03F1/14G03F7/70466G03F1/42G03F1/50
Inventor 小峰信洋
Owner KK TOSHIBA