Lithographic apparatus, device manufacturing method, and device manufactured thereby
A lithographic projection and beam technology, which is used in semiconductor/solid-state device manufacturing, photolithography process exposure devices, microlithography exposure equipment, etc., and can solve problems such as uneven boundaries
Inactive Publication Date: 2005-02-09
ASML NETHERLANDS BV
View PDF7 Cites 2 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0004] It is an object of the present invention to provide a lithographic apparatus according to the preamble, in which the problem of unevenness of the wafer holder at the boundary of the substrate holder is solved and the substrate near the edge of the substrate is made flat in a controllable manner
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0016] figure 1 A lithographic projection apparatus according to a specific embodiment of the present invention is schematically shown. The unit includes:
[0017] - a radiation system Ex, IL for providing a radiation projection beam PB (for example light in the deep ultraviolet region). In this particular case, the radiation system also includes a radiation source LA;
[0018] - a first target table (mask table) MT provided with a mask holder for holding a mask MA (e.g. a reticle) and with first positioning means for precise positioning of the mask relative to the object PL PM connection;
[0019] - a second target table (substrate table) WT provided with a substrate holder for holding a substrate W (e.g. a resist-coated silicon wafer) and with second positioning means for precise positioning of the substrate relative to the object PL PW connection;
[0020] - A projection system ("lens") PL for imaging the radiation portion of the mask MA onto a target portion C of the ...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| height | aaaaa | aaaaa |
Login to View More
Abstract
A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder comprising a plurality of protrusions defining a protrusion configuration for providing a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder comprising at least one clamping electrode for generating an electric field, for clamping a substrate against the substrate holder by said electric field; the substrate holder further comprising a peripheral supporting edge arranged to contact a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. According to the invention, the said at least one electrode extends beyond said peripheral supporting edge.
Description
technical field [0001] The invention relates to a lithographic projection apparatus comprising: a radiation system for providing a radiation projection beam; and a substrate holder for supporting a substrate placed in the optical path of said projection beam, the substrate holder comprising a plurality of a protrusion defining a protrusion structure for providing a substantially planar support plane for supporting a substantially planar substrate, the substrate holder comprising at least one clamping electrode for generating an electric field, by The electric field clamps the substrate against the substrate holder; the substrate holder further includes a peripheral support edge configured to contact the substrate. Background technique [0002] Known electrostatic fixtures are usually equipped with components using a backfill gas used to fill the spaces formed between the protrusions, a base plate forming a ground plane supporting the protrusions, and a rear portion of the su...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027G03F7/20
CPCG03F7/707G03F7/70708G03F7/70783Y10T279/23G03F7/20
Inventor J·J·奥坦斯T·A·R·范埃佩K·J·J·M·扎亚尔
Owner ASML NETHERLANDS BV