Optical information recording medium and production method therefor
A technology for recording media and optical information, which can be used in the manufacture of optical record carriers, optical record carriers, recording/reproducing by optical methods, etc., and can solve problems such as the inability to reduce poor transmittance
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example 1
[0084] In Example 1, the figure 1 The optical information recording medium shown. In the optical information recording medium in this example, all of the first to fourth recording layers 102, 202, 302, and 402 are composed of the write-once material Te-O-Pd, and the records contained in the respective information layers The composition ratio between the layers is varied so that the difference in transmittance among the information layers varies. In the optical information recording medium in this example, the state immediately after the film is formed (hereinafter referred to as "as depo. state") is an unrecorded state, and when a mark is recorded with an appropriate laser power, the mark portion Reflectivity is reduced. At this time, the marking portion is in a crystalline state. That is, in the optical information recording medium in this example, the as depo. state and the crystalline state correspond to state A and state B, respectively.
[0085] The method used to man...
example 2
[0108] In Example 2, making figure 2 The optical information recording medium shown. In the optical information recording medium of this example, both the first and second recording layers 102 and 202 are composed of the write-once material Te-O-Pd, and the transmittance difference of each information layer is adjusted by changing the composition ratio .
[0109] The method used in this example to manufacture the optical information recording medium is as follows.
[0110] A disc-shaped polycarbonate disc having a thickness of 1.1 mm and a diameter of 120 mm was used as the substrate 5, and spiral grooves having a width of 0.16 μm, a groove pitch of 0.32 μm, and a depth of 20 nm were formed on its surface. The second information layer 12 is formed by sputtering from the reflective layer 204 on the surface of the substrate 5 where the grooves are formed.
[0111] The reflective layer 204 is formed using Al-Cr, and has a thickness of 40 nm. Using SiO 2 A material mixed wit...
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Abstract
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